JPS5382268A - Production of mask - Google Patents
Production of maskInfo
- Publication number
- JPS5382268A JPS5382268A JP15735776A JP15735776A JPS5382268A JP S5382268 A JPS5382268 A JP S5382268A JP 15735776 A JP15735776 A JP 15735776A JP 15735776 A JP15735776 A JP 15735776A JP S5382268 A JPS5382268 A JP S5382268A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- layer
- production
- resist layer
- depositing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain a mask having patterns of good accuracy in a dry system by depositing an electron beam sensitive resist layer on the work, exposing the resist layer, thereafter developing the layer with CF4 gas plasma and selectively etching the layer using a chlorine gas.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15735776A JPS5382268A (en) | 1976-12-28 | 1976-12-28 | Production of mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15735776A JPS5382268A (en) | 1976-12-28 | 1976-12-28 | Production of mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5382268A true JPS5382268A (en) | 1978-07-20 |
Family
ID=15647893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15735776A Pending JPS5382268A (en) | 1976-12-28 | 1976-12-28 | Production of mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5382268A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5524420A (en) * | 1978-08-10 | 1980-02-21 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Insulated gate type filed effect transistor |
JPS57167659A (en) * | 1981-03-30 | 1982-10-15 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1976
- 1976-12-28 JP JP15735776A patent/JPS5382268A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5524420A (en) * | 1978-08-10 | 1980-02-21 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Insulated gate type filed effect transistor |
JPS57167659A (en) * | 1981-03-30 | 1982-10-15 | Fujitsu Ltd | Manufacture of semiconductor device |
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