JPS5382268A - Production of mask - Google Patents

Production of mask

Info

Publication number
JPS5382268A
JPS5382268A JP15735776A JP15735776A JPS5382268A JP S5382268 A JPS5382268 A JP S5382268A JP 15735776 A JP15735776 A JP 15735776A JP 15735776 A JP15735776 A JP 15735776A JP S5382268 A JPS5382268 A JP S5382268A
Authority
JP
Japan
Prior art keywords
mask
layer
production
resist layer
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15735776A
Other languages
Japanese (ja)
Inventor
Kiyokatsu Jinno
Hiroshi Kinoshita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15735776A priority Critical patent/JPS5382268A/en
Publication of JPS5382268A publication Critical patent/JPS5382268A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain a mask having patterns of good accuracy in a dry system by depositing an electron beam sensitive resist layer on the work, exposing the resist layer, thereafter developing the layer with CF4 gas plasma and selectively etching the layer using a chlorine gas.
COPYRIGHT: (C)1978,JPO&Japio
JP15735776A 1976-12-28 1976-12-28 Production of mask Pending JPS5382268A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15735776A JPS5382268A (en) 1976-12-28 1976-12-28 Production of mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15735776A JPS5382268A (en) 1976-12-28 1976-12-28 Production of mask

Publications (1)

Publication Number Publication Date
JPS5382268A true JPS5382268A (en) 1978-07-20

Family

ID=15647893

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15735776A Pending JPS5382268A (en) 1976-12-28 1976-12-28 Production of mask

Country Status (1)

Country Link
JP (1) JPS5382268A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5524420A (en) * 1978-08-10 1980-02-21 Chiyou Lsi Gijutsu Kenkyu Kumiai Insulated gate type filed effect transistor
JPS57167659A (en) * 1981-03-30 1982-10-15 Fujitsu Ltd Manufacture of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5524420A (en) * 1978-08-10 1980-02-21 Chiyou Lsi Gijutsu Kenkyu Kumiai Insulated gate type filed effect transistor
JPS57167659A (en) * 1981-03-30 1982-10-15 Fujitsu Ltd Manufacture of semiconductor device

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