JPS5376397A - Photo mask for manufacturing magnetic bubble element - Google Patents

Photo mask for manufacturing magnetic bubble element

Info

Publication number
JPS5376397A
JPS5376397A JP15146376A JP15146376A JPS5376397A JP S5376397 A JPS5376397 A JP S5376397A JP 15146376 A JP15146376 A JP 15146376A JP 15146376 A JP15146376 A JP 15146376A JP S5376397 A JPS5376397 A JP S5376397A
Authority
JP
Japan
Prior art keywords
photo mask
magnetic bubble
manufacturing magnetic
bubble element
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15146376A
Other languages
Japanese (ja)
Other versions
JPS6019159B2 (en
Inventor
Koji Yamada
Hideki Nishida
Norikazu Tsumita
Masaki Takahashi
Yutaka Sugita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP51151463A priority Critical patent/JPS6019159B2/en
Publication of JPS5376397A publication Critical patent/JPS5376397A/en
Publication of JPS6019159B2 publication Critical patent/JPS6019159B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE: To conduct transcription of minute pattern very precisely by releasing the gas from the resist at the time of exposure, by the use of photo mask having gutters on its surface, and by completing the tight contact between mask and wafer.
COPYRIGHT: (C)1978,JPO&Japio
JP51151463A 1976-12-18 1976-12-18 Photomask for magnetic bubble element production Expired JPS6019159B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51151463A JPS6019159B2 (en) 1976-12-18 1976-12-18 Photomask for magnetic bubble element production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51151463A JPS6019159B2 (en) 1976-12-18 1976-12-18 Photomask for magnetic bubble element production

Publications (2)

Publication Number Publication Date
JPS5376397A true JPS5376397A (en) 1978-07-06
JPS6019159B2 JPS6019159B2 (en) 1985-05-14

Family

ID=15519078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51151463A Expired JPS6019159B2 (en) 1976-12-18 1976-12-18 Photomask for magnetic bubble element production

Country Status (1)

Country Link
JP (1) JPS6019159B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05142760A (en) * 1991-11-25 1993-06-11 Sharp Corp Photomask

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5195778A (en) * 1975-02-03 1976-08-21
JPS52153669A (en) * 1976-06-16 1977-12-20 Toshiba Corp Photo mask of semiconductor integrated circuit
JPS535573A (en) * 1976-07-02 1978-01-19 Matsushita Electric Ind Co Ltd Photo mask for semiconductor device
JPS5315765A (en) * 1976-07-28 1978-02-14 Hitachi Ltd Vacuum caontact prevention method of hard mask

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5195778A (en) * 1975-02-03 1976-08-21
JPS52153669A (en) * 1976-06-16 1977-12-20 Toshiba Corp Photo mask of semiconductor integrated circuit
JPS535573A (en) * 1976-07-02 1978-01-19 Matsushita Electric Ind Co Ltd Photo mask for semiconductor device
JPS5315765A (en) * 1976-07-28 1978-02-14 Hitachi Ltd Vacuum caontact prevention method of hard mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05142760A (en) * 1991-11-25 1993-06-11 Sharp Corp Photomask

Also Published As

Publication number Publication date
JPS6019159B2 (en) 1985-05-14

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