Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Hitachi Ltd
Original Assignee
Hitachi Ltd
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Publication date
Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP7107176ApriorityCriticalpatent/JPS52154364A/en
Publication of JPS52154364ApublicationCriticalpatent/JPS52154364A/en
PURPOSE: To form a selective etching mask by leaving the substance for mask within grooves through the use of the grooves formed on a wafer surface and etching off the thin film outside the grooves.
COPYRIGHT: (C)1977,JPO&Japio
JP7107176A1976-06-181976-06-18Formation of selective etching mask
PendingJPS52154364A
(en)