JPS52112281A - Manufacture of semiconductor - Google Patents
Manufacture of semiconductorInfo
- Publication number
- JPS52112281A JPS52112281A JP2902076A JP2902076A JPS52112281A JP S52112281 A JPS52112281 A JP S52112281A JP 2902076 A JP2902076 A JP 2902076A JP 2902076 A JP2902076 A JP 2902076A JP S52112281 A JPS52112281 A JP S52112281A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- manufacture
- nitride film
- irradiation
- oxygen plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To secure easy etching of nitride film through partial oxidation of the nitride film surface by irradiation of oxygen plasma.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2902076A JPS52112281A (en) | 1976-03-17 | 1976-03-17 | Manufacture of semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2902076A JPS52112281A (en) | 1976-03-17 | 1976-03-17 | Manufacture of semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52112281A true JPS52112281A (en) | 1977-09-20 |
Family
ID=12264719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2902076A Pending JPS52112281A (en) | 1976-03-17 | 1976-03-17 | Manufacture of semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52112281A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57204134A (en) * | 1981-06-11 | 1982-12-14 | Yamagata Nippon Denki Kk | Etching method for silicon nitride film |
JPS57211235A (en) * | 1981-06-22 | 1982-12-25 | Seiko Epson Corp | Manufacture of semiconductor device |
-
1976
- 1976-03-17 JP JP2902076A patent/JPS52112281A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57204134A (en) * | 1981-06-11 | 1982-12-14 | Yamagata Nippon Denki Kk | Etching method for silicon nitride film |
JPS57211235A (en) * | 1981-06-22 | 1982-12-25 | Seiko Epson Corp | Manufacture of semiconductor device |
JPH0318333B2 (en) * | 1981-06-22 | 1991-03-12 | Seiko Epson Corp |
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