JPS52112281A - Manufacture of semiconductor - Google Patents

Manufacture of semiconductor

Info

Publication number
JPS52112281A
JPS52112281A JP2902076A JP2902076A JPS52112281A JP S52112281 A JPS52112281 A JP S52112281A JP 2902076 A JP2902076 A JP 2902076A JP 2902076 A JP2902076 A JP 2902076A JP S52112281 A JPS52112281 A JP S52112281A
Authority
JP
Japan
Prior art keywords
semiconductor
manufacture
nitride film
irradiation
oxygen plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2902076A
Other languages
Japanese (ja)
Inventor
Kenji Sugishima
Satoshi Suda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2902076A priority Critical patent/JPS52112281A/en
Publication of JPS52112281A publication Critical patent/JPS52112281A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To secure easy etching of nitride film through partial oxidation of the nitride film surface by irradiation of oxygen plasma.
COPYRIGHT: (C)1977,JPO&Japio
JP2902076A 1976-03-17 1976-03-17 Manufacture of semiconductor Pending JPS52112281A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2902076A JPS52112281A (en) 1976-03-17 1976-03-17 Manufacture of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2902076A JPS52112281A (en) 1976-03-17 1976-03-17 Manufacture of semiconductor

Publications (1)

Publication Number Publication Date
JPS52112281A true JPS52112281A (en) 1977-09-20

Family

ID=12264719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2902076A Pending JPS52112281A (en) 1976-03-17 1976-03-17 Manufacture of semiconductor

Country Status (1)

Country Link
JP (1) JPS52112281A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204134A (en) * 1981-06-11 1982-12-14 Yamagata Nippon Denki Kk Etching method for silicon nitride film
JPS57211235A (en) * 1981-06-22 1982-12-25 Seiko Epson Corp Manufacture of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204134A (en) * 1981-06-11 1982-12-14 Yamagata Nippon Denki Kk Etching method for silicon nitride film
JPS57211235A (en) * 1981-06-22 1982-12-25 Seiko Epson Corp Manufacture of semiconductor device
JPH0318333B2 (en) * 1981-06-22 1991-03-12 Seiko Epson Corp

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