JPS5315073A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5315073A
JPS5315073A JP8903576A JP8903576A JPS5315073A JP S5315073 A JPS5315073 A JP S5315073A JP 8903576 A JP8903576 A JP 8903576A JP 8903576 A JP8903576 A JP 8903576A JP S5315073 A JPS5315073 A JP S5315073A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
etching
tongues
exposing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8903576A
Other languages
Japanese (ja)
Other versions
JPS606089B2 (en
Inventor
Seiji Yasuda
Masafumi Miyagawa
Kenichi Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8903576A priority Critical patent/JPS606089B2/en
Publication of JPS5315073A publication Critical patent/JPS5315073A/en
Publication of JPS606089B2 publication Critical patent/JPS606089B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Weting (AREA)

Abstract

PURPOSE: Tongues are removed by etching without etching necessary insulation films through coating and exposing of photo resist.
COPYRIGHT: (C)1978,JPO&Japio
JP8903576A 1976-07-28 1976-07-28 Manufacturing method of semiconductor device Expired JPS606089B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8903576A JPS606089B2 (en) 1976-07-28 1976-07-28 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8903576A JPS606089B2 (en) 1976-07-28 1976-07-28 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5315073A true JPS5315073A (en) 1978-02-10
JPS606089B2 JPS606089B2 (en) 1985-02-15

Family

ID=13959629

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8903576A Expired JPS606089B2 (en) 1976-07-28 1976-07-28 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS606089B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5673440A (en) * 1979-11-21 1981-06-18 Toshiba Corp Manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5673440A (en) * 1979-11-21 1981-06-18 Toshiba Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS606089B2 (en) 1985-02-15

Similar Documents

Publication Publication Date Title
JPS53108390A (en) Semiconductor device and its manufacture
JPS52140280A (en) Semiconductor device
JPS52136590A (en) Production of semiconductor device
JPS5315073A (en) Production of semiconductor device
JPS5211868A (en) Photoresist coating method
JPS5330875A (en) Production of semiconductor device
JPS51118392A (en) Manuforcturing process for semiconductor unit
JPS543473A (en) Manufacture of semiconductor device
JPS5338277A (en) Production of semiconductor device
JPS5348458A (en) Production of semiconductor device
JPS5267271A (en) Formation of through-hole onto semiconductor substrate
JPS535578A (en) Manufacture of semiconductor device
JPS51132085A (en) Manufacturing method of semiconductor device
JPS53147468A (en) Production of semiconductor device
JPS51112277A (en) Semiconductor device and its production method
JPS51147324A (en) Solvent for electronic wire resist
JPS53108773A (en) Production of semiconductor device
JPS543471A (en) Manufacture of semiconductor device
JPS5390831A (en) Forming method for integration element
JPS5227368A (en) Selection etching method
JPS5218181A (en) Semiconductor device process
JPS5245884A (en) Process for production of semiconductor device
JPS52150962A (en) Production of semiconductor device
JPS5271993A (en) Production of semiconductor integrated circuit device
JPS52154364A (en) Formation of selective etching mask