JPS5330875A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5330875A
JPS5330875A JP10500976A JP10500976A JPS5330875A JP S5330875 A JPS5330875 A JP S5330875A JP 10500976 A JP10500976 A JP 10500976A JP 10500976 A JP10500976 A JP 10500976A JP S5330875 A JPS5330875 A JP S5330875A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
lacquer layer
gas
photosensitive lacquer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10500976A
Other languages
Japanese (ja)
Inventor
Sadasuke Komuro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP10500976A priority Critical patent/JPS5330875A/en
Publication of JPS5330875A publication Critical patent/JPS5330875A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To exhaust the air remaining between an optical mask and a photosensitive lacquer layer or the gas, etc. produced from the photosensitive lacquer layer through the gas exhaust passages provided in a semiconductor wafer.
COPYRIGHT: (C)1978,JPO&Japio
JP10500976A 1976-09-03 1976-09-03 Production of semiconductor device Pending JPS5330875A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10500976A JPS5330875A (en) 1976-09-03 1976-09-03 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10500976A JPS5330875A (en) 1976-09-03 1976-09-03 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5330875A true JPS5330875A (en) 1978-03-23

Family

ID=14396064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10500976A Pending JPS5330875A (en) 1976-09-03 1976-09-03 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5330875A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5615042A (en) * 1979-07-18 1981-02-13 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
US6168603B1 (en) 1995-02-02 2001-01-02 Boston Scientific Corporation Surgical extractor
US6348056B1 (en) 1999-08-06 2002-02-19 Scimed Life Systems, Inc. Medical retrieval device with releasable retrieval basket
US6350266B1 (en) 1995-02-02 2002-02-26 Scimed Life Systems, Inc. Hybrid stone retrieval device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5615042A (en) * 1979-07-18 1981-02-13 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
US6168603B1 (en) 1995-02-02 2001-01-02 Boston Scientific Corporation Surgical extractor
US6350266B1 (en) 1995-02-02 2002-02-26 Scimed Life Systems, Inc. Hybrid stone retrieval device
US6780193B2 (en) 1995-02-02 2004-08-24 Boston Scientific Corporation Surgical extractor
US8828022B2 (en) 1995-02-02 2014-09-09 Boston Scientific Scimed, Inc. Hybrid stone retrieval device
US6348056B1 (en) 1999-08-06 2002-02-19 Scimed Life Systems, Inc. Medical retrieval device with releasable retrieval basket

Similar Documents

Publication Publication Date Title
JPS51120180A (en) Pattern printing device
JPS5330875A (en) Production of semiconductor device
JPS5321574A (en) Contact and separation method of photo mask
JPS5339058A (en) Production of semiconductor device
JPS543473A (en) Manufacture of semiconductor device
JPS5277670A (en) Semiconductive device
JPS51126083A (en) Manufacturing method of semi-conductor equpment
JPS51150985A (en) Fabrication method of semiconductor device
JPS51112279A (en) Semiconductor device
JPS5334473A (en) Manufacture for semiconductor device
JPS52141573A (en) Manufacture of semiconductor device
JPS535578A (en) Manufacture of semiconductor device
JPS5240072A (en) Atmosphere gas substitution method at exposure of photoresist
JPS5251872A (en) Production of semiconductor device
JPS5315073A (en) Production of semiconductor device
JPS5345991A (en) Manufacture of semiconductor
JPS5397374A (en) Mask producing method
JPS5359370A (en) Positioning method
JPS5353964A (en) Electrode forming method of semiconductor device
JPS5318965A (en) Resist coating method
JPS5355979A (en) Manufacture of semiconductor device
JPS5325369A (en) Production of semiconductor device
JPS5345174A (en) Moisture resistant semiconductor device
JPS5377168A (en) Production of semiconductor device
JPS5334471A (en) Manufacture for semiconductor device