JPS535578A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS535578A
JPS535578A JP8024876A JP8024876A JPS535578A JP S535578 A JPS535578 A JP S535578A JP 8024876 A JP8024876 A JP 8024876A JP 8024876 A JP8024876 A JP 8024876A JP S535578 A JPS535578 A JP S535578A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
poly
diffusion
differenge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8024876A
Other languages
Japanese (ja)
Other versions
JPS6020903B2 (en
Inventor
Kazuo Horie
Yoichi Akasaka
Katsuhiro Tsukamoto
Hiroichi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8024876A priority Critical patent/JPS6020903B2/en
Publication of JPS535578A publication Critical patent/JPS535578A/en
Publication of JPS6020903B2 publication Critical patent/JPS6020903B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To simplify the manufacturing process by performing a selective diffusion using deped poly Si for the diffusion source and using the resist film for the mask and by utilizing the stage differenge caused by etching the oxidation thin film formed on poly Si.
COPYRIGHT: (C)1978,JPO&Japio
JP8024876A 1976-07-05 1976-07-05 Manufacturing method of semiconductor device Expired JPS6020903B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8024876A JPS6020903B2 (en) 1976-07-05 1976-07-05 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8024876A JPS6020903B2 (en) 1976-07-05 1976-07-05 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS535578A true JPS535578A (en) 1978-01-19
JPS6020903B2 JPS6020903B2 (en) 1985-05-24

Family

ID=13713010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8024876A Expired JPS6020903B2 (en) 1976-07-05 1976-07-05 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS6020903B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62211949A (en) * 1986-03-13 1987-09-17 Fujitsu Ltd Manufacture of semiconductor device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60188610U (en) * 1984-05-28 1985-12-13 トヨタ自動車株式会社 Compliance steer suppression device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62211949A (en) * 1986-03-13 1987-09-17 Fujitsu Ltd Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS6020903B2 (en) 1985-05-24

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