JPS5359370A - Positioning method - Google Patents

Positioning method

Info

Publication number
JPS5359370A
JPS5359370A JP13404876A JP13404876A JPS5359370A JP S5359370 A JPS5359370 A JP S5359370A JP 13404876 A JP13404876 A JP 13404876A JP 13404876 A JP13404876 A JP 13404876A JP S5359370 A JPS5359370 A JP S5359370A
Authority
JP
Japan
Prior art keywords
positioning
positioning method
wothout
photoetching
deteriorating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13404876A
Other languages
Japanese (ja)
Inventor
Osamu Minato
Ryoichi Hori
Tetsukazu Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13404876A priority Critical patent/JPS5359370A/en
Publication of JPS5359370A publication Critical patent/JPS5359370A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To perform the positioning between a mask and a wafer for photoetching with reducing considerably the occupied area of the positioning pattern and wothout deteriorating the positioning accuracy between plural photomasks and a substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP13404876A 1976-11-10 1976-11-10 Positioning method Pending JPS5359370A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13404876A JPS5359370A (en) 1976-11-10 1976-11-10 Positioning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13404876A JPS5359370A (en) 1976-11-10 1976-11-10 Positioning method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP59027051A Division JPS59161033A (en) 1984-02-17 1984-02-17 Photo mask

Publications (1)

Publication Number Publication Date
JPS5359370A true JPS5359370A (en) 1978-05-29

Family

ID=15119134

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13404876A Pending JPS5359370A (en) 1976-11-10 1976-11-10 Positioning method

Country Status (1)

Country Link
JP (1) JPS5359370A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54157478A (en) * 1978-06-01 1979-12-12 Canon Inc Alignment method
JPS6028249A (en) * 1983-07-27 1985-02-13 Oki Electric Ind Co Ltd Mask substrate with mask alignment chip

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54157478A (en) * 1978-06-01 1979-12-12 Canon Inc Alignment method
JPS63942B2 (en) * 1978-06-01 1988-01-09 Canon Kk
JPS6028249A (en) * 1983-07-27 1985-02-13 Oki Electric Ind Co Ltd Mask substrate with mask alignment chip

Similar Documents

Publication Publication Date Title
JPS51120180A (en) Pattern printing device
JPS5339075A (en) Step and repeat exposure method of masks
JPS5352072A (en) Pattern for alignment
JPS5223263A (en) Method of manufacturing semiconductor device
JPS52152172A (en) Working method of mask alignment mark holes
JPS5359370A (en) Positioning method
JPS5494881A (en) Exposure method
JPS5431282A (en) Pattern formation method
JPS51136289A (en) Semi-conductor producing
JPS5425169A (en) Matching method for photo mask against semiconductor wafer
JPS53127266A (en) Forming method of marker
JPS53117384A (en) Photoetching mask
JPS5387668A (en) Forming method of patterns
JPS5376757A (en) Photoetching method
JPS5277670A (en) Semiconductive device
JPS5330875A (en) Production of semiconductor device
JPS52106681A (en) Etching method
JPS5390763A (en) Semiconductor element and mask for producing semiconductor element
JPS5255866A (en) Etching method
JPS5384477A (en) Forming method of dry etching mask
JPS53108773A (en) Production of semiconductor device
JPS5299773A (en) Forming method for small size regions
JPS52111382A (en) Photo-mask producing for semi-conductor
JPS52119179A (en) Electron beam exposing method
JPS5240072A (en) Atmosphere gas substitution method at exposure of photoresist