JPS5272175A - Mask patterning of resist meterial - Google Patents

Mask patterning of resist meterial

Info

Publication number
JPS5272175A
JPS5272175A JP14884675A JP14884675A JPS5272175A JP S5272175 A JPS5272175 A JP S5272175A JP 14884675 A JP14884675 A JP 14884675A JP 14884675 A JP14884675 A JP 14884675A JP S5272175 A JPS5272175 A JP S5272175A
Authority
JP
Japan
Prior art keywords
meterial
resist
mask patterning
resist film
exposed portions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14884675A
Other languages
Japanese (ja)
Inventor
Hisao Yakushiji
Kazuto Suehiro
Kazushi Nagata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14884675A priority Critical patent/JPS5272175A/en
Publication of JPS5272175A publication Critical patent/JPS5272175A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Semiconductors (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To accurately finish photo resist film to required patterns by a dry type developing method using the difference in the rate of removal by etching between the exposed portions and non-exposed portions of the photo resist film by plasmas of gas.
COPYRIGHT: (C)1977,JPO&Japio
JP14884675A 1975-12-12 1975-12-12 Mask patterning of resist meterial Pending JPS5272175A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14884675A JPS5272175A (en) 1975-12-12 1975-12-12 Mask patterning of resist meterial

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14884675A JPS5272175A (en) 1975-12-12 1975-12-12 Mask patterning of resist meterial

Publications (1)

Publication Number Publication Date
JPS5272175A true JPS5272175A (en) 1977-06-16

Family

ID=15462034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14884675A Pending JPS5272175A (en) 1975-12-12 1975-12-12 Mask patterning of resist meterial

Country Status (1)

Country Link
JP (1) JPS5272175A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52155531A (en) * 1976-06-17 1977-12-24 Motorola Inc Dry photo resist developing method
JPS5427369A (en) * 1977-08-01 1979-03-01 Hitachi Ltd Pattern formation method
JPS5711344A (en) * 1980-06-25 1982-01-21 Mitsubishi Electric Corp Dry developing method
JPS582025A (en) * 1981-06-29 1983-01-07 Fujitsu Ltd Pattern formation

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509549A (en) * 1973-05-30 1975-01-31

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509549A (en) * 1973-05-30 1975-01-31

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52155531A (en) * 1976-06-17 1977-12-24 Motorola Inc Dry photo resist developing method
JPS5712138B2 (en) * 1976-06-17 1982-03-09
JPS5427369A (en) * 1977-08-01 1979-03-01 Hitachi Ltd Pattern formation method
JPS5711344A (en) * 1980-06-25 1982-01-21 Mitsubishi Electric Corp Dry developing method
JPH0313583B2 (en) * 1980-06-25 1991-02-22 Mitsubishi Electric Corp
JPS582025A (en) * 1981-06-29 1983-01-07 Fujitsu Ltd Pattern formation
JPS6364773B2 (en) * 1981-06-29 1988-12-13

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