JPS5272175A - Mask patterning of resist meterial - Google Patents
Mask patterning of resist meterialInfo
- Publication number
- JPS5272175A JPS5272175A JP14884675A JP14884675A JPS5272175A JP S5272175 A JPS5272175 A JP S5272175A JP 14884675 A JP14884675 A JP 14884675A JP 14884675 A JP14884675 A JP 14884675A JP S5272175 A JPS5272175 A JP S5272175A
- Authority
- JP
- Japan
- Prior art keywords
- meterial
- resist
- mask patterning
- resist film
- exposed portions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Drying Of Semiconductors (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To accurately finish photo resist film to required patterns by a dry type developing method using the difference in the rate of removal by etching between the exposed portions and non-exposed portions of the photo resist film by plasmas of gas.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14884675A JPS5272175A (en) | 1975-12-12 | 1975-12-12 | Mask patterning of resist meterial |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14884675A JPS5272175A (en) | 1975-12-12 | 1975-12-12 | Mask patterning of resist meterial |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5272175A true JPS5272175A (en) | 1977-06-16 |
Family
ID=15462034
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14884675A Pending JPS5272175A (en) | 1975-12-12 | 1975-12-12 | Mask patterning of resist meterial |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5272175A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52155531A (en) * | 1976-06-17 | 1977-12-24 | Motorola Inc | Dry photo resist developing method |
JPS5427369A (en) * | 1977-08-01 | 1979-03-01 | Hitachi Ltd | Pattern formation method |
JPS5711344A (en) * | 1980-06-25 | 1982-01-21 | Mitsubishi Electric Corp | Dry developing method |
JPS582025A (en) * | 1981-06-29 | 1983-01-07 | Fujitsu Ltd | Pattern formation |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS509549A (en) * | 1973-05-30 | 1975-01-31 |
-
1975
- 1975-12-12 JP JP14884675A patent/JPS5272175A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS509549A (en) * | 1973-05-30 | 1975-01-31 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52155531A (en) * | 1976-06-17 | 1977-12-24 | Motorola Inc | Dry photo resist developing method |
JPS5712138B2 (en) * | 1976-06-17 | 1982-03-09 | ||
JPS5427369A (en) * | 1977-08-01 | 1979-03-01 | Hitachi Ltd | Pattern formation method |
JPS5711344A (en) * | 1980-06-25 | 1982-01-21 | Mitsubishi Electric Corp | Dry developing method |
JPH0313583B2 (en) * | 1980-06-25 | 1991-02-22 | Mitsubishi Electric Corp | |
JPS582025A (en) * | 1981-06-29 | 1983-01-07 | Fujitsu Ltd | Pattern formation |
JPS6364773B2 (en) * | 1981-06-29 | 1988-12-13 |
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