Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co LtdfiledCriticalToshiba Corp
Priority to JP3817676ApriorityCriticalpatent/JPS52122082A/en
Publication of JPS52122082ApublicationCriticalpatent/JPS52122082A/en
PURPOSE: To reduce the probability of appearance of pinholes by exposing the portion of a large area with a positive type resist film of high mask accuracy.
COPYRIGHT: (C)1977,JPO&Japio
JP3817676A1976-04-071976-04-07Making method for electronic beam mask
PendingJPS52122082A
(en)