JPS51147261A - Forming method of pattern - Google Patents

Forming method of pattern

Info

Publication number
JPS51147261A
JPS51147261A JP7159175A JP7159175A JPS51147261A JP S51147261 A JPS51147261 A JP S51147261A JP 7159175 A JP7159175 A JP 7159175A JP 7159175 A JP7159175 A JP 7159175A JP S51147261 A JPS51147261 A JP S51147261A
Authority
JP
Japan
Prior art keywords
pattern
forming method
resist
type resist
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7159175A
Other languages
Japanese (ja)
Inventor
Kenzo Yanagida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7159175A priority Critical patent/JPS51147261A/en
Publication of JPS51147261A publication Critical patent/JPS51147261A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To obtain the same pattern as a negative-type resist by cutting down the time of exposure against a resist when a positive-type resist is exposed to an electronic beam.
COPYRIGHT: (C)1976,JPO&Japio
JP7159175A 1975-06-13 1975-06-13 Forming method of pattern Pending JPS51147261A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7159175A JPS51147261A (en) 1975-06-13 1975-06-13 Forming method of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7159175A JPS51147261A (en) 1975-06-13 1975-06-13 Forming method of pattern

Publications (1)

Publication Number Publication Date
JPS51147261A true JPS51147261A (en) 1976-12-17

Family

ID=13465059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7159175A Pending JPS51147261A (en) 1975-06-13 1975-06-13 Forming method of pattern

Country Status (1)

Country Link
JP (1) JPS51147261A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57162331A (en) * 1981-03-31 1982-10-06 Fujitsu Ltd Forming method for wiring pattern
JPS5928336A (en) * 1982-08-09 1984-02-15 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57162331A (en) * 1981-03-31 1982-10-06 Fujitsu Ltd Forming method for wiring pattern
JPS5928336A (en) * 1982-08-09 1984-02-15 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method

Similar Documents

Publication Publication Date Title
JPS5290269A (en) Forming method for fine resist patterns
JPS5251871A (en) Projecting method for charge particle beams
JPS5211774A (en) Method of detecting relative position of patterns
JPS52123173A (en) Sputter etching method
JPS51147261A (en) Forming method of pattern
JPS5230170A (en) Method of photoetching
JPS5421271A (en) Pattern forming method
JPS5389673A (en) Fine pattern forming method of semiconductor device
JPS51139267A (en) Photo-mask
JPS51148365A (en) Electron beam exposure method
JPS52117077A (en) Electron beam-exposing method
JPS5226095A (en) Patterning method
JPS5228267A (en) Minute processing
JPS51151073A (en) Method to adjust the position of an mask for an integrated circuit
JPS5244571A (en) Method of forming fine pattern
JPS526480A (en) Production process of semiconductor unit
JPS51114931A (en) Photoresist pattern formation method
JPS534477A (en) Production of semiconductor device
JPS5313880A (en) Fine patterning method
JPS5267651A (en) Method for interference exposure
JPS52117569A (en) Electronic beam exposure unit
JPS5299775A (en) Pattern exposing method
JPS5234758A (en) Process for the fabrication of a character plate
JPS527096A (en) Pattern making method
JPS51142276A (en) Method of exposing photo-resist