JPS53135580A - Electron beam exposing method - Google Patents
Electron beam exposing methodInfo
- Publication number
- JPS53135580A JPS53135580A JP5051777A JP5051777A JPS53135580A JP S53135580 A JPS53135580 A JP S53135580A JP 5051777 A JP5051777 A JP 5051777A JP 5051777 A JP5051777 A JP 5051777A JP S53135580 A JPS53135580 A JP S53135580A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- pattern
- exposing method
- beam exposing
- exposing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To avoid the effect of closing around the pattern, by exposing only the rimmed pattern with a high accelerating voltage first through the use of negative resist for the lower layer and the positive resist for the upper layer, and next, by exposing the positive layer only around the pattern with a lower accelerating voltage.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5051777A JPS53135580A (en) | 1977-04-30 | 1977-04-30 | Electron beam exposing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5051777A JPS53135580A (en) | 1977-04-30 | 1977-04-30 | Electron beam exposing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53135580A true JPS53135580A (en) | 1978-11-27 |
Family
ID=12861154
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5051777A Pending JPS53135580A (en) | 1977-04-30 | 1977-04-30 | Electron beam exposing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53135580A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57211228A (en) * | 1981-06-22 | 1982-12-25 | Hitachi Ltd | Formation of pattern |
KR100685861B1 (en) | 2005-11-14 | 2007-02-22 | 재단법인서울대학교산학협력재단 | Method for forming the nano-scale pattern of e-beam resist |
-
1977
- 1977-04-30 JP JP5051777A patent/JPS53135580A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57211228A (en) * | 1981-06-22 | 1982-12-25 | Hitachi Ltd | Formation of pattern |
KR100685861B1 (en) | 2005-11-14 | 2007-02-22 | 재단법인서울대학교산학협력재단 | Method for forming the nano-scale pattern of e-beam resist |
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