JPS53135580A - Electron beam exposing method - Google Patents

Electron beam exposing method

Info

Publication number
JPS53135580A
JPS53135580A JP5051777A JP5051777A JPS53135580A JP S53135580 A JPS53135580 A JP S53135580A JP 5051777 A JP5051777 A JP 5051777A JP 5051777 A JP5051777 A JP 5051777A JP S53135580 A JPS53135580 A JP S53135580A
Authority
JP
Japan
Prior art keywords
electron beam
pattern
exposing method
beam exposing
exposing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5051777A
Other languages
Japanese (ja)
Inventor
Moritaka Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5051777A priority Critical patent/JPS53135580A/en
Publication of JPS53135580A publication Critical patent/JPS53135580A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To avoid the effect of closing around the pattern, by exposing only the rimmed pattern with a high accelerating voltage first through the use of negative resist for the lower layer and the positive resist for the upper layer, and next, by exposing the positive layer only around the pattern with a lower accelerating voltage.
COPYRIGHT: (C)1978,JPO&Japio
JP5051777A 1977-04-30 1977-04-30 Electron beam exposing method Pending JPS53135580A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5051777A JPS53135580A (en) 1977-04-30 1977-04-30 Electron beam exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5051777A JPS53135580A (en) 1977-04-30 1977-04-30 Electron beam exposing method

Publications (1)

Publication Number Publication Date
JPS53135580A true JPS53135580A (en) 1978-11-27

Family

ID=12861154

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5051777A Pending JPS53135580A (en) 1977-04-30 1977-04-30 Electron beam exposing method

Country Status (1)

Country Link
JP (1) JPS53135580A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211228A (en) * 1981-06-22 1982-12-25 Hitachi Ltd Formation of pattern
KR100685861B1 (en) 2005-11-14 2007-02-22 재단법인서울대학교산학협력재단 Method for forming the nano-scale pattern of e-beam resist

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211228A (en) * 1981-06-22 1982-12-25 Hitachi Ltd Formation of pattern
KR100685861B1 (en) 2005-11-14 2007-02-22 재단법인서울대학교산학협력재단 Method for forming the nano-scale pattern of e-beam resist

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