JPS53146623A - Photoetching mask - Google Patents

Photoetching mask

Info

Publication number
JPS53146623A
JPS53146623A JP6195177A JP6195177A JPS53146623A JP S53146623 A JPS53146623 A JP S53146623A JP 6195177 A JP6195177 A JP 6195177A JP 6195177 A JP6195177 A JP 6195177A JP S53146623 A JPS53146623 A JP S53146623A
Authority
JP
Japan
Prior art keywords
photoetching mask
production
accruacy
anx
durability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6195177A
Other languages
Japanese (ja)
Inventor
Takayuki Yanagawa
Toshio Oguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6195177A priority Critical patent/JPS53146623A/en
Publication of JPS53146623A publication Critical patent/JPS53146623A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To additionally improve the durability of anX-ray exposure mask for production of semiconductor devices, increases its accruacy and make possible easy production of the same by implanting particles accelerated to high energy thereby forming an organic film having sufficient mechanical strength.
COPYRIGHT: (C)1978,JPO&Japio
JP6195177A 1977-05-26 1977-05-26 Photoetching mask Pending JPS53146623A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6195177A JPS53146623A (en) 1977-05-26 1977-05-26 Photoetching mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6195177A JPS53146623A (en) 1977-05-26 1977-05-26 Photoetching mask

Publications (1)

Publication Number Publication Date
JPS53146623A true JPS53146623A (en) 1978-12-20

Family

ID=13186002

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6195177A Pending JPS53146623A (en) 1977-05-26 1977-05-26 Photoetching mask

Country Status (1)

Country Link
JP (1) JPS53146623A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56112728A (en) * 1980-02-12 1981-09-05 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of exposure mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56112728A (en) * 1980-02-12 1981-09-05 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of exposure mask

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