JPS5324782A - Forming method of high molecular film patterns by negative resist - Google Patents
Forming method of high molecular film patterns by negative resistInfo
- Publication number
- JPS5324782A JPS5324782A JP9873676A JP9873676A JPS5324782A JP S5324782 A JPS5324782 A JP S5324782A JP 9873676 A JP9873676 A JP 9873676A JP 9873676 A JP9873676 A JP 9873676A JP S5324782 A JPS5324782 A JP S5324782A
- Authority
- JP
- Japan
- Prior art keywords
- high molecular
- film patterns
- molecular film
- forming method
- negative resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To readily form high molecular film patterns which are sensitive to energy rays, provide high resolution and are free from fog by laminating two kinds of negative type resists of varying sensitivities.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9873676A JPS5324782A (en) | 1976-08-20 | 1976-08-20 | Forming method of high molecular film patterns by negative resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9873676A JPS5324782A (en) | 1976-08-20 | 1976-08-20 | Forming method of high molecular film patterns by negative resist |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5324782A true JPS5324782A (en) | 1978-03-07 |
JPS5531612B2 JPS5531612B2 (en) | 1980-08-19 |
Family
ID=14227783
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9873676A Granted JPS5324782A (en) | 1976-08-20 | 1976-08-20 | Forming method of high molecular film patterns by negative resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5324782A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5655044A (en) * | 1979-10-11 | 1981-05-15 | Fujitsu Ltd | Formation of resist pattern |
JPS58218119A (en) * | 1982-06-14 | 1983-12-19 | Hitachi Ltd | Pattern forming method |
JPS6091639A (en) * | 1983-10-26 | 1985-05-23 | Alps Electric Co Ltd | Formation of photo resist pattern |
JPS62108525A (en) * | 1985-11-06 | 1987-05-19 | Hitachi Ltd | Method and apparatus for surface treating |
JPH01193730A (en) * | 1988-01-29 | 1989-08-03 | Sumitomo Bakelite Co Ltd | Thick film working method for polyimide resin |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10684709B2 (en) | 2015-12-22 | 2020-06-16 | Shenzhen Royole Technologies Co., Ltd. | Electronic bags |
-
1976
- 1976-08-20 JP JP9873676A patent/JPS5324782A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5655044A (en) * | 1979-10-11 | 1981-05-15 | Fujitsu Ltd | Formation of resist pattern |
JPS58218119A (en) * | 1982-06-14 | 1983-12-19 | Hitachi Ltd | Pattern forming method |
JPS6091639A (en) * | 1983-10-26 | 1985-05-23 | Alps Electric Co Ltd | Formation of photo resist pattern |
JPS62108525A (en) * | 1985-11-06 | 1987-05-19 | Hitachi Ltd | Method and apparatus for surface treating |
JPH01193730A (en) * | 1988-01-29 | 1989-08-03 | Sumitomo Bakelite Co Ltd | Thick film working method for polyimide resin |
Also Published As
Publication number | Publication date |
---|---|
JPS5531612B2 (en) | 1980-08-19 |
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