JPS5295177A - Electronic beam mask and manufacture - Google Patents

Electronic beam mask and manufacture

Info

Publication number
JPS5295177A
JPS5295177A JP1127976A JP1127976A JPS5295177A JP S5295177 A JPS5295177 A JP S5295177A JP 1127976 A JP1127976 A JP 1127976A JP 1127976 A JP1127976 A JP 1127976A JP S5295177 A JPS5295177 A JP S5295177A
Authority
JP
Japan
Prior art keywords
electronic beam
manufacture
beam mask
stopping part
electronic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1127976A
Other languages
Japanese (ja)
Other versions
JPS5334459B2 (en
Inventor
Koichi Tatsuno
Satoru Nakayama
Kiichi Takamoto
Kazumasa Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP1127976A priority Critical patent/JPS5295177A/en
Publication of JPS5295177A publication Critical patent/JPS5295177A/en
Publication of JPS5334459B2 publication Critical patent/JPS5334459B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To improve the mechanical tension and precision by forming the mesh type holding body on the passing part of the electronic beam to hold the stopping part of electronic beam and by radiating the heat caused when the beam clashes into the stopping part and the charge to the electronic beam mask wave.
COPYRIGHT: (C)1977,JPO&Japio
JP1127976A 1976-02-06 1976-02-06 Electronic beam mask and manufacture Granted JPS5295177A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1127976A JPS5295177A (en) 1976-02-06 1976-02-06 Electronic beam mask and manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1127976A JPS5295177A (en) 1976-02-06 1976-02-06 Electronic beam mask and manufacture

Publications (2)

Publication Number Publication Date
JPS5295177A true JPS5295177A (en) 1977-08-10
JPS5334459B2 JPS5334459B2 (en) 1978-09-20

Family

ID=11773541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1127976A Granted JPS5295177A (en) 1976-02-06 1976-02-06 Electronic beam mask and manufacture

Country Status (1)

Country Link
JP (1) JPS5295177A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61183926A (en) * 1985-02-08 1986-08-16 Toshiba Corp Charged beam irradiation unit

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0520305Y2 (en) * 1986-05-26 1993-05-26

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM TECHNICAL DISCLOSURE BULLETIN#N11=1973 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61183926A (en) * 1985-02-08 1986-08-16 Toshiba Corp Charged beam irradiation unit

Also Published As

Publication number Publication date
JPS5334459B2 (en) 1978-09-20

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