JPS52119078A - Field-junction electron beam expoure device - Google Patents

Field-junction electron beam expoure device

Info

Publication number
JPS52119078A
JPS52119078A JP3427576A JP3427576A JPS52119078A JP S52119078 A JPS52119078 A JP S52119078A JP 3427576 A JP3427576 A JP 3427576A JP 3427576 A JP3427576 A JP 3427576A JP S52119078 A JPS52119078 A JP S52119078A
Authority
JP
Japan
Prior art keywords
field
electron beam
expoure
junction electron
junction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3427576A
Other languages
Japanese (ja)
Other versions
JPS5820135B2 (en
Inventor
Masahiro Okabe
Seigo Igaki
Noriaki Nakayama
Yasuo Furukawa
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3427576A priority Critical patent/JPS5820135B2/en
Publication of JPS52119078A publication Critical patent/JPS52119078A/en
Publication of JPS5820135B2 publication Critical patent/JPS5820135B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: In bonding two patterns which are exposed within the field and extend to the adjacent fields, the proximity effect is removed, so that field-bonded electron beam exposure can be performed.
COPYRIGHT: (C)1977,JPO&Japio
JP3427576A 1976-03-31 1976-03-31 Field junction electron beam exposure equipment Expired JPS5820135B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3427576A JPS5820135B2 (en) 1976-03-31 1976-03-31 Field junction electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3427576A JPS5820135B2 (en) 1976-03-31 1976-03-31 Field junction electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS52119078A true JPS52119078A (en) 1977-10-06
JPS5820135B2 JPS5820135B2 (en) 1983-04-21

Family

ID=12409600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3427576A Expired JPS5820135B2 (en) 1976-03-31 1976-03-31 Field junction electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS5820135B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580318A (en) * 1978-12-12 1980-06-17 Fujitsu Ltd Electron-beam exposure
JPS57161900U (en) * 1981-04-03 1982-10-12
JPS57167626A (en) * 1981-03-31 1982-10-15 Fujitsu Ltd Electron beam exposure equipment
US6828573B1 (en) 1998-05-29 2004-12-07 Hitachi, Ltd. Electron beam lithography system

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10902537B2 (en) 2016-11-23 2021-01-26 Electronics And Telecommunications Research Institute Method of processing logistics information, logistics information processing server using the same, and logistics managing apparatus using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580318A (en) * 1978-12-12 1980-06-17 Fujitsu Ltd Electron-beam exposure
JPS57167626A (en) * 1981-03-31 1982-10-15 Fujitsu Ltd Electron beam exposure equipment
JPS632140B2 (en) * 1981-03-31 1988-01-18 Fujitsu Ltd
JPS57161900U (en) * 1981-04-03 1982-10-12
US6828573B1 (en) 1998-05-29 2004-12-07 Hitachi, Ltd. Electron beam lithography system

Also Published As

Publication number Publication date
JPS5820135B2 (en) 1983-04-21

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