JPS57167626A - Electron beam exposure equipment - Google Patents

Electron beam exposure equipment

Info

Publication number
JPS57167626A
JPS57167626A JP4743181A JP4743181A JPS57167626A JP S57167626 A JPS57167626 A JP S57167626A JP 4743181 A JP4743181 A JP 4743181A JP 4743181 A JP4743181 A JP 4743181A JP S57167626 A JPS57167626 A JP S57167626A
Authority
JP
Japan
Prior art keywords
oscillation element
quartz oscillation
contents
pattern
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4743181A
Other languages
Japanese (ja)
Other versions
JPS632140B2 (en
Inventor
Seigo Igaki
Toshihiro Ishizuka
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4743181A priority Critical patent/JPS57167626A/en
Publication of JPS57167626A publication Critical patent/JPS57167626A/en
Publication of JPS632140B2 publication Critical patent/JPS632140B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To avoid disorder of the exposure condition in case of changing a quartz oscillation element by a method wherein when it is cletected that the quartz oscillation element should be changed a driving counter is started after the oscillation of the selected quartz oscillation element becomes stable. CONSTITUTION:While one pattern is being sketched, the exposure frequency data of the pattern to be sketched next are read out from a memory 2 by the instruction of a CPU1 and stored in a frequency register 13. The contents of this frequency register 13 and a frequency register in which the exposure frequency data of the present pattern are put into a comparing circuit 14 and the both contents are compared right after the pottern sketching presently carried out is completed. If both contents do not agree, in other words the quartz oscillation element should be changed, one-shot single multi 15 is reversed and a gate circuit 16 is kept open until the newly selected quartz oscillation element becomes stable and the start of a driving counter 4 is delayed.
JP4743181A 1981-03-31 1981-03-31 Electron beam exposure equipment Granted JPS57167626A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4743181A JPS57167626A (en) 1981-03-31 1981-03-31 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4743181A JPS57167626A (en) 1981-03-31 1981-03-31 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS57167626A true JPS57167626A (en) 1982-10-15
JPS632140B2 JPS632140B2 (en) 1988-01-18

Family

ID=12774955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4743181A Granted JPS57167626A (en) 1981-03-31 1981-03-31 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS57167626A (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119078A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Field-junction electron beam expoure device
JPS5394773A (en) * 1977-01-31 1978-08-19 Cho Lsi Gijutsu Kenkyu Kumiai Method of connecting graph in charged beam exposing device
JPS54122979A (en) * 1978-03-16 1979-09-22 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam exposure device
JPS5580322A (en) * 1978-12-11 1980-06-17 Fujitsu Ltd Illuminating method of electron-beam
JPH05503992A (en) * 1989-11-09 1993-06-24 アイ―スタット　コーポレーション Fluid head for testing chemical and ionic sensors

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119078A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Field-junction electron beam expoure device
JPS5394773A (en) * 1977-01-31 1978-08-19 Cho Lsi Gijutsu Kenkyu Kumiai Method of connecting graph in charged beam exposing device
JPS54122979A (en) * 1978-03-16 1979-09-22 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam exposure device
JPS5580322A (en) * 1978-12-11 1980-06-17 Fujitsu Ltd Illuminating method of electron-beam
JPH05503992A (en) * 1989-11-09 1993-06-24 アイ―スタット　コーポレーション Fluid head for testing chemical and ionic sensors

Also Published As

Publication number Publication date
JPS632140B2 (en) 1988-01-18

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