JPS52119079A - Electron beam exposure - Google Patents
Electron beam exposureInfo
- Publication number
- JPS52119079A JPS52119079A JP3540276A JP3540276A JPS52119079A JP S52119079 A JPS52119079 A JP S52119079A JP 3540276 A JP3540276 A JP 3540276A JP 3540276 A JP3540276 A JP 3540276A JP S52119079 A JPS52119079 A JP S52119079A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- beam exposure
- exposure
- exposing
- exposing points
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Or Original Feeding In Electrophotography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: Exposure is given by changing the number of exposing points according to the pattern area so that the quantity of exposure at exposing points will exceed the prescribed quantity of exposure--thereby making it possible to produce micropatterns at high accuracy.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51035402A JPS5948538B2 (en) | 1976-03-31 | 1976-03-31 | Electron beam exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51035402A JPS5948538B2 (en) | 1976-03-31 | 1976-03-31 | Electron beam exposure method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52119079A true JPS52119079A (en) | 1977-10-06 |
JPS5948538B2 JPS5948538B2 (en) | 1984-11-27 |
Family
ID=12440907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51035402A Expired JPS5948538B2 (en) | 1976-03-31 | 1976-03-31 | Electron beam exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5948538B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54143071A (en) * | 1978-04-28 | 1979-11-07 | Fujitsu Ltd | Electron-beam exposure system |
JPS62295419A (en) * | 1987-05-29 | 1987-12-22 | Toshiba Corp | Electron beam exposure apparatus |
-
1976
- 1976-03-31 JP JP51035402A patent/JPS5948538B2/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54143071A (en) * | 1978-04-28 | 1979-11-07 | Fujitsu Ltd | Electron-beam exposure system |
JPS5828730B2 (en) * | 1978-04-28 | 1983-06-17 | 富士通株式会社 | Electron beam exposure equipment |
JPS62295419A (en) * | 1987-05-29 | 1987-12-22 | Toshiba Corp | Electron beam exposure apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS5948538B2 (en) | 1984-11-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS52143776A (en) | Electron beam exposure apparatus | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS52119079A (en) | Electron beam exposure | |
JPS5359374A (en) | Electron beam exposure unit | |
JPS5431282A (en) | Pattern formation method | |
JPS51126073A (en) | Pattern printing equpment made available by photo-etching method | |
JPS51148365A (en) | Electron beam exposure method | |
JPS5251870A (en) | Electron bean exposure method | |
JPS5362477A (en) | Electron beam drawing device | |
JPS5347825A (en) | Photoresist exposure | |
JPS51139267A (en) | Photo-mask | |
JPS5358770A (en) | Electron beam exposure apparatus | |
JPS534477A (en) | Production of semiconductor device | |
JPS53114676A (en) | Electron beam exposure method | |
JPS5313880A (en) | Fine patterning method | |
JPS53120277A (en) | Electron beam exposure device | |
JPS52119179A (en) | Electron beam exposing method | |
JPS53120276A (en) | Electron beam exposure method | |
JPS51147261A (en) | Forming method of pattern | |
JPS5244571A (en) | Method of forming fine pattern | |
JPS5357764A (en) | Electron beam exposure apparatus | |
JPS5357973A (en) | Preparation of photo mask | |
JPS5440572A (en) | Electron-beam pattern projector | |
JPS5350978A (en) | Electron beam exposure method | |
JPS5358773A (en) | Electron beam exposure method |