JPS52119079A - Electron beam exposure - Google Patents

Electron beam exposure

Info

Publication number
JPS52119079A
JPS52119079A JP3540276A JP3540276A JPS52119079A JP S52119079 A JPS52119079 A JP S52119079A JP 3540276 A JP3540276 A JP 3540276A JP 3540276 A JP3540276 A JP 3540276A JP S52119079 A JPS52119079 A JP S52119079A
Authority
JP
Japan
Prior art keywords
electron beam
beam exposure
exposure
exposing
exposing points
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3540276A
Other languages
Japanese (ja)
Other versions
JPS5948538B2 (en
Inventor
Haruo Tsuchikawa
Hiroshi Yasuda
Kenichi Kawashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP51035402A priority Critical patent/JPS5948538B2/en
Publication of JPS52119079A publication Critical patent/JPS52119079A/en
Publication of JPS5948538B2 publication Critical patent/JPS5948538B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: Exposure is given by changing the number of exposing points according to the pattern area so that the quantity of exposure at exposing points will exceed the prescribed quantity of exposure--thereby making it possible to produce micropatterns at high accuracy.
COPYRIGHT: (C)1977,JPO&Japio
JP51035402A 1976-03-31 1976-03-31 Electron beam exposure method Expired JPS5948538B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51035402A JPS5948538B2 (en) 1976-03-31 1976-03-31 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51035402A JPS5948538B2 (en) 1976-03-31 1976-03-31 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS52119079A true JPS52119079A (en) 1977-10-06
JPS5948538B2 JPS5948538B2 (en) 1984-11-27

Family

ID=12440907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51035402A Expired JPS5948538B2 (en) 1976-03-31 1976-03-31 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS5948538B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54143071A (en) * 1978-04-28 1979-11-07 Fujitsu Ltd Electron-beam exposure system
JPS62295419A (en) * 1987-05-29 1987-12-22 Toshiba Corp Electron beam exposure apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54143071A (en) * 1978-04-28 1979-11-07 Fujitsu Ltd Electron-beam exposure system
JPS5828730B2 (en) * 1978-04-28 1983-06-17 富士通株式会社 Electron beam exposure equipment
JPS62295419A (en) * 1987-05-29 1987-12-22 Toshiba Corp Electron beam exposure apparatus

Also Published As

Publication number Publication date
JPS5948538B2 (en) 1984-11-27

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