JPS5358770A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS5358770A
JPS5358770A JP13389876A JP13389876A JPS5358770A JP S5358770 A JPS5358770 A JP S5358770A JP 13389876 A JP13389876 A JP 13389876A JP 13389876 A JP13389876 A JP 13389876A JP S5358770 A JPS5358770 A JP S5358770A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
beam exposure
oprimum
giving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13389876A
Other languages
Japanese (ja)
Other versions
JPS6038020B2 (en
Inventor
Kazumitsu Tanaka
Nobuo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP51133898A priority Critical patent/JPS6038020B2/en
Publication of JPS5358770A publication Critical patent/JPS5358770A/en
Publication of JPS6038020B2 publication Critical patent/JPS6038020B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:The occurrence of proximity effect is suppressed by giving oprimum exposure to each pattern.
JP51133898A 1976-11-08 1976-11-08 Electron beam exposure equipment Expired JPS6038020B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51133898A JPS6038020B2 (en) 1976-11-08 1976-11-08 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51133898A JPS6038020B2 (en) 1976-11-08 1976-11-08 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS5358770A true JPS5358770A (en) 1978-05-26
JPS6038020B2 JPS6038020B2 (en) 1985-08-29

Family

ID=15115674

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51133898A Expired JPS6038020B2 (en) 1976-11-08 1976-11-08 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS6038020B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55155455A (en) * 1979-05-21 1980-12-03 Nec Corp Pulse electron beam generating method
JPS5834918A (en) * 1981-08-26 1983-03-01 Fujitsu Ltd Electron beam exposure
JPS60134419A (en) * 1983-12-22 1985-07-17 Jeol Ltd Charged particle beam exposure device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01166421U (en) * 1988-05-10 1989-11-21

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3876883A (en) * 1972-06-30 1975-04-08 Ibm Method and system for focusing and registration in electron beam projection microfabrication
JPS51147262A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Electronic beam exposure method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3876883A (en) * 1972-06-30 1975-04-08 Ibm Method and system for focusing and registration in electron beam projection microfabrication
JPS51147262A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Electronic beam exposure method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55155455A (en) * 1979-05-21 1980-12-03 Nec Corp Pulse electron beam generating method
JPS5834918A (en) * 1981-08-26 1983-03-01 Fujitsu Ltd Electron beam exposure
JPH0262941B2 (en) * 1981-08-26 1990-12-27 Fujitsu Ltd
JPS60134419A (en) * 1983-12-22 1985-07-17 Jeol Ltd Charged particle beam exposure device
JPH0357609B2 (en) * 1983-12-22 1991-09-02 Nippon Electron Optics Lab

Also Published As

Publication number Publication date
JPS6038020B2 (en) 1985-08-29

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