JPS5358770A - Electron beam exposure apparatus - Google Patents
Electron beam exposure apparatusInfo
- Publication number
- JPS5358770A JPS5358770A JP13389876A JP13389876A JPS5358770A JP S5358770 A JPS5358770 A JP S5358770A JP 13389876 A JP13389876 A JP 13389876A JP 13389876 A JP13389876 A JP 13389876A JP S5358770 A JPS5358770 A JP S5358770A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure apparatus
- beam exposure
- oprimum
- giving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51133898A JPS6038020B2 (en) | 1976-11-08 | 1976-11-08 | Electron beam exposure equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51133898A JPS6038020B2 (en) | 1976-11-08 | 1976-11-08 | Electron beam exposure equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5358770A true JPS5358770A (en) | 1978-05-26 |
JPS6038020B2 JPS6038020B2 (en) | 1985-08-29 |
Family
ID=15115674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51133898A Expired JPS6038020B2 (en) | 1976-11-08 | 1976-11-08 | Electron beam exposure equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6038020B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55155455A (en) * | 1979-05-21 | 1980-12-03 | Nec Corp | Pulse electron beam generating method |
JPS5834918A (en) * | 1981-08-26 | 1983-03-01 | Fujitsu Ltd | Electron beam exposure |
JPS60134419A (en) * | 1983-12-22 | 1985-07-17 | Jeol Ltd | Charged particle beam exposure device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01166421U (en) * | 1988-05-10 | 1989-11-21 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3876883A (en) * | 1972-06-30 | 1975-04-08 | Ibm | Method and system for focusing and registration in electron beam projection microfabrication |
JPS51147262A (en) * | 1975-06-13 | 1976-12-17 | Fujitsu Ltd | Electronic beam exposure method |
-
1976
- 1976-11-08 JP JP51133898A patent/JPS6038020B2/en not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3876883A (en) * | 1972-06-30 | 1975-04-08 | Ibm | Method and system for focusing and registration in electron beam projection microfabrication |
JPS51147262A (en) * | 1975-06-13 | 1976-12-17 | Fujitsu Ltd | Electronic beam exposure method |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55155455A (en) * | 1979-05-21 | 1980-12-03 | Nec Corp | Pulse electron beam generating method |
JPS5834918A (en) * | 1981-08-26 | 1983-03-01 | Fujitsu Ltd | Electron beam exposure |
JPH0262941B2 (en) * | 1981-08-26 | 1990-12-27 | Fujitsu Ltd | |
JPS60134419A (en) * | 1983-12-22 | 1985-07-17 | Jeol Ltd | Charged particle beam exposure device |
JPH0357609B2 (en) * | 1983-12-22 | 1991-09-02 | Nippon Electron Optics Lab |
Also Published As
Publication number | Publication date |
---|---|
JPS6038020B2 (en) | 1985-08-29 |
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Legal Events
Date | Code | Title | Description |
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A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040412 |
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A131 | Notification of reasons for refusal |
Effective date: 20050802 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
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A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20051028 |
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A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20051212 |
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A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060118 |
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A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20060328 |
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A521 | Written amendment |
Effective date: 20060726 Free format text: JAPANESE INTERMEDIATE CODE: A523 |
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A911 | Transfer of reconsideration by examiner before appeal (zenchi) |
Effective date: 20060817 Free format text: JAPANESE INTERMEDIATE CODE: A911 |
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A912 | Removal of reconsideration by examiner before appeal (zenchi) |
Effective date: 20061019 Free format text: JAPANESE INTERMEDIATE CODE: A912 |
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A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20070822 |
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A602 | Written permission of extension of time |
Effective date: 20070827 Free format text: JAPANESE INTERMEDIATE CODE: A602 |