JPS55155455A - Pulse electron beam generating method - Google Patents

Pulse electron beam generating method

Info

Publication number
JPS55155455A
JPS55155455A JP6241979A JP6241979A JPS55155455A JP S55155455 A JPS55155455 A JP S55155455A JP 6241979 A JP6241979 A JP 6241979A JP 6241979 A JP6241979 A JP 6241979A JP S55155455 A JPS55155455 A JP S55155455A
Authority
JP
Japan
Prior art keywords
electron beam
pulse electron
voltage
conductor plate
generating method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6241979A
Other languages
Japanese (ja)
Inventor
Hirokazu Yuasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6241979A priority Critical patent/JPS55155455A/en
Publication of JPS55155455A publication Critical patent/JPS55155455A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To finely trim the timing of the pulse electron beam by applying a step- voltage to one conductor plate and a direct current voltage to the other conductor plate. CONSTITUTION:A conductor plate 1 is connected with a step voltage generator 3. By varying the DC voltage applied to the conductor plate 1, the timing of the pulse electron beam can be trimmed. A pulse electron beam can be also generated by the step-voltage of one-side polarity.
JP6241979A 1979-05-21 1979-05-21 Pulse electron beam generating method Pending JPS55155455A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6241979A JPS55155455A (en) 1979-05-21 1979-05-21 Pulse electron beam generating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6241979A JPS55155455A (en) 1979-05-21 1979-05-21 Pulse electron beam generating method

Publications (1)

Publication Number Publication Date
JPS55155455A true JPS55155455A (en) 1980-12-03

Family

ID=13199605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6241979A Pending JPS55155455A (en) 1979-05-21 1979-05-21 Pulse electron beam generating method

Country Status (1)

Country Link
JP (1) JPS55155455A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50140994A (en) * 1974-04-22 1975-11-12
JPS5358770A (en) * 1976-11-08 1978-05-26 Jeol Ltd Electron beam exposure apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50140994A (en) * 1974-04-22 1975-11-12
JPS5358770A (en) * 1976-11-08 1978-05-26 Jeol Ltd Electron beam exposure apparatus

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