JPS5357764A - Electron beam exposure apparatus - Google Patents
Electron beam exposure apparatusInfo
- Publication number
- JPS5357764A JPS5357764A JP13262076A JP13262076A JPS5357764A JP S5357764 A JPS5357764 A JP S5357764A JP 13262076 A JP13262076 A JP 13262076A JP 13262076 A JP13262076 A JP 13262076A JP S5357764 A JPS5357764 A JP S5357764A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure apparatus
- beam exposure
- diaphragms
- providing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To perform exposure of various shapes by providing a plurality of specified holes of varying shapes to one of first or second diaphragms.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13262076A JPS5357764A (en) | 1976-11-04 | 1976-11-04 | Electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13262076A JPS5357764A (en) | 1976-11-04 | 1976-11-04 | Electron beam exposure apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5357764A true JPS5357764A (en) | 1978-05-25 |
JPS5649445B2 JPS5649445B2 (en) | 1981-11-21 |
Family
ID=15085574
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13262076A Granted JPS5357764A (en) | 1976-11-04 | 1976-11-04 | Electron beam exposure apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5357764A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5429981A (en) * | 1977-08-10 | 1979-03-06 | Ibm | Device for radiating electron beam |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54374A (en) * | 1977-05-30 | 1979-01-05 | Nippon Yusoki Co Ltd | Controller of unmanned travelling car |
-
1976
- 1976-11-04 JP JP13262076A patent/JPS5357764A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54374A (en) * | 1977-05-30 | 1979-01-05 | Nippon Yusoki Co Ltd | Controller of unmanned travelling car |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5429981A (en) * | 1977-08-10 | 1979-03-06 | Ibm | Device for radiating electron beam |
JPS5438035B2 (en) * | 1977-08-10 | 1979-11-19 |
Also Published As
Publication number | Publication date |
---|---|
JPS5649445B2 (en) | 1981-11-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS52119178A (en) | Electron beam exposure device | |
JPS52143776A (en) | Electron beam exposure apparatus | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS5357760A (en) | Electron beam exposure apparatus | |
JPS51126073A (en) | Pattern printing equpment made available by photo-etching method | |
JPS5357764A (en) | Electron beam exposure apparatus | |
JPS51148365A (en) | Electron beam exposure method | |
JPS51139267A (en) | Photo-mask | |
JPS5251870A (en) | Electron bean exposure method | |
JPS52143772A (en) | Alignment method of masks using special reference marks | |
JPS52119079A (en) | Electron beam exposure | |
JPS534477A (en) | Production of semiconductor device | |
JPS53145476A (en) | Electron beam exposure apparatus | |
JPS5358772A (en) | Electron beam exposure apparatus | |
JPS53145477A (en) | Electron beam exposure method | |
JPS53114676A (en) | Electron beam exposure method | |
JPS5440572A (en) | Electron-beam pattern projector | |
JPS52119179A (en) | Electron beam exposing method | |
JPS5358771A (en) | Electron beam exposure apparatus | |
JPS53144677A (en) | Electron beam mask and production of the same | |
JPS52119184A (en) | Electron beam exposing method | |
JPS53101279A (en) | Electron beam exposure device | |
JPS52123133A (en) | Printing equipment | |
JPS5342678A (en) | X-ray exposure method | |
JPS5358775A (en) | Production of diaphragm for electron beam exposure apparatus |