JPS53145477A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS53145477A
JPS53145477A JP6013277A JP6013277A JPS53145477A JP S53145477 A JPS53145477 A JP S53145477A JP 6013277 A JP6013277 A JP 6013277A JP 6013277 A JP6013277 A JP 6013277A JP S53145477 A JPS53145477 A JP S53145477A
Authority
JP
Japan
Prior art keywords
electron beam
exposure method
beam exposure
peripheral part
slit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6013277A
Other languages
Japanese (ja)
Other versions
JPS548074B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Sakae Miyauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP6013277A priority Critical patent/JPS53145477A/en
Publication of JPS53145477A publication Critical patent/JPS53145477A/en
Publication of JPS548074B2 publication Critical patent/JPS548074B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To prevent the degradation in exposure accuracy based on the blur of the peripheral part of the image of the electron beam passing port of a first slit by projecting the image of the peripheral part of the electron beam transmitting light port of a second slit on the peripheral part of the exposure pattern on the exposed material.
COPYRIGHT: (C)1978,JPO&Japio
JP6013277A 1977-05-24 1977-05-24 Electron beam exposure method Granted JPS53145477A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6013277A JPS53145477A (en) 1977-05-24 1977-05-24 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6013277A JPS53145477A (en) 1977-05-24 1977-05-24 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS53145477A true JPS53145477A (en) 1978-12-18
JPS548074B2 JPS548074B2 (en) 1979-04-12

Family

ID=13133293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6013277A Granted JPS53145477A (en) 1977-05-24 1977-05-24 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS53145477A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03291911A (en) * 1990-04-09 1991-12-24 Nec Corp Charged beam exposure method
JP2009054945A (en) * 2007-08-29 2009-03-12 Nuflare Technology Inc Lithographic method by electrically charged particle beams

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03291911A (en) * 1990-04-09 1991-12-24 Nec Corp Charged beam exposure method
JP2009054945A (en) * 2007-08-29 2009-03-12 Nuflare Technology Inc Lithographic method by electrically charged particle beams
USRE44179E1 (en) 2007-08-29 2013-04-30 Nuflare Technology, Inc. Charged particle beam writing method

Also Published As

Publication number Publication date
JPS548074B2 (en) 1979-04-12

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