JPS53145477A - Electron beam exposure method - Google Patents
Electron beam exposure methodInfo
- Publication number
- JPS53145477A JPS53145477A JP6013277A JP6013277A JPS53145477A JP S53145477 A JPS53145477 A JP S53145477A JP 6013277 A JP6013277 A JP 6013277A JP 6013277 A JP6013277 A JP 6013277A JP S53145477 A JPS53145477 A JP S53145477A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure method
- beam exposure
- peripheral part
- slit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To prevent the degradation in exposure accuracy based on the blur of the peripheral part of the image of the electron beam passing port of a first slit by projecting the image of the peripheral part of the electron beam transmitting light port of a second slit on the peripheral part of the exposure pattern on the exposed material.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6013277A JPS53145477A (en) | 1977-05-24 | 1977-05-24 | Electron beam exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6013277A JPS53145477A (en) | 1977-05-24 | 1977-05-24 | Electron beam exposure method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53145477A true JPS53145477A (en) | 1978-12-18 |
JPS548074B2 JPS548074B2 (en) | 1979-04-12 |
Family
ID=13133293
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6013277A Granted JPS53145477A (en) | 1977-05-24 | 1977-05-24 | Electron beam exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53145477A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03291911A (en) * | 1990-04-09 | 1991-12-24 | Nec Corp | Charged beam exposure method |
JP2009054945A (en) * | 2007-08-29 | 2009-03-12 | Nuflare Technology Inc | Lithographic method by electrically charged particle beams |
-
1977
- 1977-05-24 JP JP6013277A patent/JPS53145477A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03291911A (en) * | 1990-04-09 | 1991-12-24 | Nec Corp | Charged beam exposure method |
JP2009054945A (en) * | 2007-08-29 | 2009-03-12 | Nuflare Technology Inc | Lithographic method by electrically charged particle beams |
USRE44179E1 (en) | 2007-08-29 | 2013-04-30 | Nuflare Technology, Inc. | Charged particle beam writing method |
Also Published As
Publication number | Publication date |
---|---|
JPS548074B2 (en) | 1979-04-12 |
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