JPS53117385A - Exposure mask for patterning - Google Patents

Exposure mask for patterning

Info

Publication number
JPS53117385A
JPS53117385A JP3255677A JP3255677A JPS53117385A JP S53117385 A JPS53117385 A JP S53117385A JP 3255677 A JP3255677 A JP 3255677A JP 3255677 A JP3255677 A JP 3255677A JP S53117385 A JPS53117385 A JP S53117385A
Authority
JP
Japan
Prior art keywords
exposure mask
patterning
bright
dark
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3255677A
Other languages
Japanese (ja)
Inventor
Yoshio Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP3255677A priority Critical patent/JPS53117385A/en
Publication of JPS53117385A publication Critical patent/JPS53117385A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To make an effective exposure mask by providing patterns of the degrees of transparency of bright, dark and the intermediate of bright and dark on the same mask substrate and making exposed regions of three levels on resist film by one exposure.
COPYRIGHT: (C)1978,JPO&Japio
JP3255677A 1977-03-23 1977-03-23 Exposure mask for patterning Pending JPS53117385A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3255677A JPS53117385A (en) 1977-03-23 1977-03-23 Exposure mask for patterning

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3255677A JPS53117385A (en) 1977-03-23 1977-03-23 Exposure mask for patterning

Publications (1)

Publication Number Publication Date
JPS53117385A true JPS53117385A (en) 1978-10-13

Family

ID=12362181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3255677A Pending JPS53117385A (en) 1977-03-23 1977-03-23 Exposure mask for patterning

Country Status (1)

Country Link
JP (1) JPS53117385A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635137A (en) * 1979-08-31 1981-04-07 Nec Corp Photomask
JPS60108852A (en) * 1983-11-18 1985-06-14 Fuji Xerox Co Ltd Mask for exposure of photolithography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635137A (en) * 1979-08-31 1981-04-07 Nec Corp Photomask
JPS60108852A (en) * 1983-11-18 1985-06-14 Fuji Xerox Co Ltd Mask for exposure of photolithography

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