JPS53117385A - Exposure mask for patterning - Google Patents
Exposure mask for patterningInfo
- Publication number
- JPS53117385A JPS53117385A JP3255677A JP3255677A JPS53117385A JP S53117385 A JPS53117385 A JP S53117385A JP 3255677 A JP3255677 A JP 3255677A JP 3255677 A JP3255677 A JP 3255677A JP S53117385 A JPS53117385 A JP S53117385A
- Authority
- JP
- Japan
- Prior art keywords
- exposure mask
- patterning
- bright
- dark
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To make an effective exposure mask by providing patterns of the degrees of transparency of bright, dark and the intermediate of bright and dark on the same mask substrate and making exposed regions of three levels on resist film by one exposure.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3255677A JPS53117385A (en) | 1977-03-23 | 1977-03-23 | Exposure mask for patterning |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3255677A JPS53117385A (en) | 1977-03-23 | 1977-03-23 | Exposure mask for patterning |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53117385A true JPS53117385A (en) | 1978-10-13 |
Family
ID=12362181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3255677A Pending JPS53117385A (en) | 1977-03-23 | 1977-03-23 | Exposure mask for patterning |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53117385A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5635137A (en) * | 1979-08-31 | 1981-04-07 | Nec Corp | Photomask |
JPS60108852A (en) * | 1983-11-18 | 1985-06-14 | Fuji Xerox Co Ltd | Mask for exposure of photolithography |
-
1977
- 1977-03-23 JP JP3255677A patent/JPS53117385A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5635137A (en) * | 1979-08-31 | 1981-04-07 | Nec Corp | Photomask |
JPS60108852A (en) * | 1983-11-18 | 1985-06-14 | Fuji Xerox Co Ltd | Mask for exposure of photolithography |
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