Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co LtdfiledCriticalToshiba Corp
Priority to JP3571077ApriorityCriticalpatent/JPS53120374A/en
Publication of JPS53120374ApublicationCriticalpatent/JPS53120374A/en
PURPOSE: To prevent peeling of photosensitive film on wafer by using a radiation sensitive photo resist of positive type such as polychlorinated hydrocarbon, etc. as a sensisitive film and making a photo mask having surface inactive fine patterns.
COPYRIGHT: (C)1978,JPO&Japio
JP3571077A1977-03-301977-03-30Production of photo mask
PendingJPS53120374A
(en)