JPS5357973A - Preparation of photo mask - Google Patents
Preparation of photo maskInfo
- Publication number
- JPS5357973A JPS5357973A JP13356976A JP13356976A JPS5357973A JP S5357973 A JPS5357973 A JP S5357973A JP 13356976 A JP13356976 A JP 13356976A JP 13356976 A JP13356976 A JP 13356976A JP S5357973 A JPS5357973 A JP S5357973A
- Authority
- JP
- Japan
- Prior art keywords
- preparation
- photo mask
- hiterto
- turnabout
- detrimental
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To form metal photo masks of fine patterns without using an electron exposure apparatus or the like by making use on the contrary of the turnabout of radiation light which has hiterto been a detrimental cause.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13356976A JPS5357973A (en) | 1976-11-05 | 1976-11-05 | Preparation of photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13356976A JPS5357973A (en) | 1976-11-05 | 1976-11-05 | Preparation of photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5357973A true JPS5357973A (en) | 1978-05-25 |
Family
ID=15107864
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13356976A Pending JPS5357973A (en) | 1976-11-05 | 1976-11-05 | Preparation of photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5357973A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS557799A (en) * | 1978-06-29 | 1980-01-19 | Siemens Ag | Production of precise*flat molded parts |
JPS5848055A (en) * | 1981-09-17 | 1983-03-19 | Mizuho Shoji Kk | Production of original plate for engraver |
-
1976
- 1976-11-05 JP JP13356976A patent/JPS5357973A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS557799A (en) * | 1978-06-29 | 1980-01-19 | Siemens Ag | Production of precise*flat molded parts |
JPH0232619B2 (en) * | 1978-06-29 | 1990-07-23 | Siemens Ag | |
JPS5848055A (en) * | 1981-09-17 | 1983-03-19 | Mizuho Shoji Kk | Production of original plate for engraver |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5211774A (en) | Method of detecting relative position of patterns | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS5226171A (en) | Mask creation method | |
JPS5357973A (en) | Preparation of photo mask | |
JPS542668A (en) | Manufacture of semiconductor device | |
JPS51126073A (en) | Pattern printing equpment made available by photo-etching method | |
JPS52139381A (en) | Electron beam exposure apparatus | |
JPS5431282A (en) | Pattern formation method | |
JPS52173A (en) | X-ray etching mask | |
JPS51148365A (en) | Electron beam exposure method | |
JPS5251870A (en) | Electron bean exposure method | |
JPS5389673A (en) | Fine pattern forming method of semiconductor device | |
JPS5347825A (en) | Photoresist exposure | |
JPS52143772A (en) | Alignment method of masks using special reference marks | |
JPS5228267A (en) | Minute processing | |
JPS51139267A (en) | Photo-mask | |
JPS5318964A (en) | X-ray projection and exposure system | |
JPS5215266A (en) | Pattern printing unit | |
JPS5314570A (en) | Production of photo mask | |
JPS5313880A (en) | Fine patterning method | |
JPS5286778A (en) | Mask aligning method for x-ray exposure | |
JPS5350978A (en) | Electron beam exposure method | |
JPS52156569A (en) | Production of optical mask | |
JPS53136965A (en) | Pattern formation method for manufacture of electron beam mask | |
JPS5255867A (en) | Exposure method |