JPS51148370A - Electron ray exposure method - Google Patents
Electron ray exposure methodInfo
- Publication number
- JPS51148370A JPS51148370A JP7259575A JP7259575A JPS51148370A JP S51148370 A JPS51148370 A JP S51148370A JP 7259575 A JP7259575 A JP 7259575A JP 7259575 A JP7259575 A JP 7259575A JP S51148370 A JPS51148370 A JP S51148370A
- Authority
- JP
- Japan
- Prior art keywords
- electron ray
- exposure method
- ray exposure
- electron
- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To enable a minute pattern processing on an electron ray sense material by doing various kinds of printing using an electron ray exposure method.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7259575A JPS51148370A (en) | 1975-06-14 | 1975-06-14 | Electron ray exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7259575A JPS51148370A (en) | 1975-06-14 | 1975-06-14 | Electron ray exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51148370A true JPS51148370A (en) | 1976-12-20 |
Family
ID=13493899
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7259575A Pending JPS51148370A (en) | 1975-06-14 | 1975-06-14 | Electron ray exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51148370A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5366284U (en) * | 1976-11-02 | 1978-06-03 | ||
JPS54101674A (en) * | 1978-01-27 | 1979-08-10 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of forming electron beam pattern |
JPS6236820A (en) * | 1985-08-12 | 1987-02-17 | Canon Inc | Alignment device and its mask |
JPH0799683B2 (en) * | 1986-03-07 | 1995-10-25 | ヒユ−ズ・エアクラフト・カンパニ− | Masked ion beam lithography system and method |
-
1975
- 1975-06-14 JP JP7259575A patent/JPS51148370A/en active Pending
Non-Patent Citations (1)
Title |
---|
IBM TECHNICAL DISCLOSURE BULLETIN=1974 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5366284U (en) * | 1976-11-02 | 1978-06-03 | ||
JPS5713467Y2 (en) * | 1976-11-02 | 1982-03-18 | ||
JPS54101674A (en) * | 1978-01-27 | 1979-08-10 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of forming electron beam pattern |
JPS6236820A (en) * | 1985-08-12 | 1987-02-17 | Canon Inc | Alignment device and its mask |
JPH0799683B2 (en) * | 1986-03-07 | 1995-10-25 | ヒユ−ズ・エアクラフト・カンパニ− | Masked ion beam lithography system and method |
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