JPS53127267A - Inspection method for pattern - Google Patents

Inspection method for pattern

Info

Publication number
JPS53127267A
JPS53127267A JP4288277A JP4288277A JPS53127267A JP S53127267 A JPS53127267 A JP S53127267A JP 4288277 A JP4288277 A JP 4288277A JP 4288277 A JP4288277 A JP 4288277A JP S53127267 A JPS53127267 A JP S53127267A
Authority
JP
Japan
Prior art keywords
pattern
inspection method
evaluate
quality
change
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4288277A
Other languages
Japanese (ja)
Other versions
JPS6146965B2 (en
Inventor
Tadao Kato
Kyoichiro Fujikawa
Tadashi Kashiwagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP4288277A priority Critical patent/JPS53127267A/en
Publication of JPS53127267A publication Critical patent/JPS53127267A/en
Publication of JPS6146965B2 publication Critical patent/JPS6146965B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: To evaluate the quality of a formed film, by forming a pattern by radiating electron beam and simultaneously monitoring the change in the current flown to the electron ray emission hardening type resist film.
COPYRIGHT: (C)1978,JPO&Japio
JP4288277A 1977-04-13 1977-04-13 Inspection method for pattern Granted JPS53127267A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4288277A JPS53127267A (en) 1977-04-13 1977-04-13 Inspection method for pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4288277A JPS53127267A (en) 1977-04-13 1977-04-13 Inspection method for pattern

Publications (2)

Publication Number Publication Date
JPS53127267A true JPS53127267A (en) 1978-11-07
JPS6146965B2 JPS6146965B2 (en) 1986-10-16

Family

ID=12648398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4288277A Granted JPS53127267A (en) 1977-04-13 1977-04-13 Inspection method for pattern

Country Status (1)

Country Link
JP (1) JPS53127267A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59155941A (en) * 1983-02-25 1984-09-05 Hitachi Ltd Electron-beam inspection device
JPS61108145A (en) * 1984-10-31 1986-05-26 Kazumichi Kimura Detecting device for detecting semiconductor pellet

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59155941A (en) * 1983-02-25 1984-09-05 Hitachi Ltd Electron-beam inspection device
JPH0563939B2 (en) * 1983-02-25 1993-09-13 Hitachi Ltd
JPS61108145A (en) * 1984-10-31 1986-05-26 Kazumichi Kimura Detecting device for detecting semiconductor pellet

Also Published As

Publication number Publication date
JPS6146965B2 (en) 1986-10-16

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