JPS5358771A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS5358771A
JPS5358771A JP13389976A JP13389976A JPS5358771A JP S5358771 A JPS5358771 A JP S5358771A JP 13389976 A JP13389976 A JP 13389976A JP 13389976 A JP13389976 A JP 13389976A JP S5358771 A JPS5358771 A JP S5358771A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
beam exposure
mask
poisition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13389976A
Other languages
Japanese (ja)
Inventor
Sakae Miyauchi
Kazumitsu Tanaka
Nobuo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP13389976A priority Critical patent/JPS5358771A/en
Publication of JPS5358771A publication Critical patent/JPS5358771A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: The deformation and poisition change of a mask are reduced by providing a shading mask above the mask.
COPYRIGHT: (C)1978,JPO&Japio
JP13389976A 1976-11-08 1976-11-08 Electron beam exposure apparatus Pending JPS5358771A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13389976A JPS5358771A (en) 1976-11-08 1976-11-08 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13389976A JPS5358771A (en) 1976-11-08 1976-11-08 Electron beam exposure apparatus

Publications (1)

Publication Number Publication Date
JPS5358771A true JPS5358771A (en) 1978-05-26

Family

ID=15115697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13389976A Pending JPS5358771A (en) 1976-11-08 1976-11-08 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS5358771A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503078U (en) * 1973-05-07 1975-01-13

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503078U (en) * 1973-05-07 1975-01-13

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