JPS5318964A - X-ray projection and exposure system - Google Patents

X-ray projection and exposure system

Info

Publication number
JPS5318964A
JPS5318964A JP9322976A JP9322976A JPS5318964A JP S5318964 A JPS5318964 A JP S5318964A JP 9322976 A JP9322976 A JP 9322976A JP 9322976 A JP9322976 A JP 9322976A JP S5318964 A JPS5318964 A JP S5318964A
Authority
JP
Japan
Prior art keywords
exposure system
ray projection
mask
ray
margin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9322976A
Other languages
Japanese (ja)
Other versions
JPS5322429B2 (en
Inventor
Toa Hayasaka
Satoru Nakayama
Shinichi Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9322976A priority Critical patent/JPS5318964A/en
Publication of JPS5318964A publication Critical patent/JPS5318964A/en
Publication of JPS5322429B2 publication Critical patent/JPS5322429B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE: To increase the margin of space controlling of a mask and a wafer without decreasing pattern accuracy and without increasing exposure time by inserting an X-ray collimator between an X-ray source and a mask.
COPYRIGHT: (C)1978,JPO&Japio
JP9322976A 1976-08-06 1976-08-06 X-ray projection and exposure system Granted JPS5318964A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9322976A JPS5318964A (en) 1976-08-06 1976-08-06 X-ray projection and exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9322976A JPS5318964A (en) 1976-08-06 1976-08-06 X-ray projection and exposure system

Publications (2)

Publication Number Publication Date
JPS5318964A true JPS5318964A (en) 1978-02-21
JPS5322429B2 JPS5322429B2 (en) 1978-07-08

Family

ID=14076704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9322976A Granted JPS5318964A (en) 1976-08-06 1976-08-06 X-ray projection and exposure system

Country Status (1)

Country Link
JP (1) JPS5318964A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4718076A (en) * 1983-04-22 1988-01-05 Kabushiki Kaisha Toshiba X-ray imaging apparatus
JPH07209876A (en) * 1995-01-30 1995-08-11 Canon Inc X-ray transfer device and method
JP2000098091A (en) * 1998-09-28 2000-04-07 Rigaku Corp Solar slit and x-ray device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5826177Y2 (en) * 1979-08-16 1983-06-06 共和産業株式会社 Structure of bearing support part of automobile sun visor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4718076A (en) * 1983-04-22 1988-01-05 Kabushiki Kaisha Toshiba X-ray imaging apparatus
JPH07209876A (en) * 1995-01-30 1995-08-11 Canon Inc X-ray transfer device and method
JP2000098091A (en) * 1998-09-28 2000-04-07 Rigaku Corp Solar slit and x-ray device

Also Published As

Publication number Publication date
JPS5322429B2 (en) 1978-07-08

Similar Documents

Publication Publication Date Title
JPS51111076A (en) Exposure device
JPS5228875A (en) Mask
JPS5434777A (en) Mask aligner
JPS5211774A (en) Method of detecting relative position of patterns
JPS5318964A (en) X-ray projection and exposure system
JPS5226191A (en) Package of photo-semiconductor element
JPS5314568A (en) Photolithography treatment system device
JPS5347825A (en) Photoresist exposure
JPS5373073A (en) Treatment method for photo resist
JPS52173A (en) X-ray etching mask
JPS5276879A (en) Counting device for number of exposure times of electron beam exposure device
JPS51114931A (en) Photoresist pattern formation method
JPS527723A (en) Photographic lens of large aperture ratio
JPS5286778A (en) Mask aligning method for x-ray exposure
JPS53131031A (en) Operation cnontroller for copying apparatus
JPS5294128A (en) Exposure control systemfor flash shooting
JPS5216171A (en) Mask fitting device
JPS5357973A (en) Preparation of photo mask
JPS52110026A (en) Camera
JPS52119079A (en) Electron beam exposure
JPS51116669A (en) Film cassette for an electron microscope or other apparatus
JPS5342678A (en) X-ray exposure method
JPS5251873A (en) Electron beam exposure device
JPS5358771A (en) Electron beam exposure apparatus
JPS5215383A (en) Raidation dose meter element supporter