JPS5429981A - Device for radiating electron beam - Google Patents

Device for radiating electron beam

Info

Publication number
JPS5429981A
JPS5429981A JP8411578A JP8411578A JPS5429981A JP S5429981 A JPS5429981 A JP S5429981A JP 8411578 A JP8411578 A JP 8411578A JP 8411578 A JP8411578 A JP 8411578A JP S5429981 A JPS5429981 A JP S5429981A
Authority
JP
Japan
Prior art keywords
electron beam
radiating electron
radiating
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8411578A
Other languages
Japanese (ja)
Other versions
JPS5438035B2 (en
Inventor
Kurisuchiyan Fuaifuaa Hansu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5429981A publication Critical patent/JPS5429981A/en
Publication of JPS5438035B2 publication Critical patent/JPS5438035B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
JP8411578A 1977-08-10 1978-07-12 Device for radiating electron beam Granted JPS5429981A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82335277A 1977-08-10 1977-08-10

Publications (2)

Publication Number Publication Date
JPS5429981A true JPS5429981A (en) 1979-03-06
JPS5438035B2 JPS5438035B2 (en) 1979-11-19

Family

ID=25238513

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8411578A Granted JPS5429981A (en) 1977-08-10 1978-07-12 Device for radiating electron beam

Country Status (9)

Country Link
JP (1) JPS5429981A (en)
BR (1) BR7804994A (en)
CH (1) CH631574A5 (en)
DE (1) DE2834391C2 (en)
FR (1) FR2400256A1 (en)
GB (1) GB1598219A (en)
IT (1) IT1112285B (en)
NL (1) NL7808162A (en)
SE (1) SE425838B (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5435173U (en) * 1977-08-12 1979-03-07
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
JPS61183926A (en) * 1985-02-08 1986-08-16 Toshiba Corp Charged beam irradiation unit
JPS62206828A (en) * 1986-03-06 1987-09-11 Nec Corp Charged-particle beam lithography device
JPH02246318A (en) * 1989-03-20 1990-10-02 Fujitsu Ltd Charged particle beam aligner
US5557110A (en) * 1994-01-19 1996-09-17 Nec Corporation Aperture for use in electron beam system for pattern writing
US6288407B1 (en) 1996-08-30 2001-09-11 Nec Corporation Electron beam-writing apparatus and electron beam-writing method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2488043A1 (en) * 1980-07-30 1982-02-05 Le N Proizv Probe dia. variation device for electron beam analysis - uses two beam deflectors and has fixed multi-aperture plate
JPS57206173A (en) * 1981-06-15 1982-12-17 Nippon Telegr & Teleph Corp <Ntt> Focusing deflecting device for charged corpuscule beam

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS5357764A (en) * 1976-11-04 1978-05-25 Fujitsu Ltd Electron beam exposure apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
DE2460716C2 (en) * 1974-12-19 1976-12-30 Siemens Ag BODY RAY OPTICAL DEVICE FOR BODY RADIATION OF A PREPARATION
US3956635A (en) * 1975-06-13 1976-05-11 International Business Machines Corporation Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
FR2351497A1 (en) * 1976-05-14 1977-12-09 Thomson Csf Corpuscular optics lens arrangement - projects image onto object by subsequent programmed drawing of picture elements onto object (NL 16.11.77)
CA1166766A (en) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Method and apparatus for forming a variable size electron beam
US4182958A (en) * 1977-05-31 1980-01-08 Rikagaku Kenkyusho Method and apparatus for projecting a beam of electrically charged particles

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS5357764A (en) * 1976-11-04 1978-05-25 Fujitsu Ltd Electron beam exposure apparatus

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5435173U (en) * 1977-08-12 1979-03-07
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
JPS626341B2 (en) * 1977-10-29 1987-02-10 Nippon Avionics Co Ltd
JPS61183926A (en) * 1985-02-08 1986-08-16 Toshiba Corp Charged beam irradiation unit
JPS62206828A (en) * 1986-03-06 1987-09-11 Nec Corp Charged-particle beam lithography device
JPH02246318A (en) * 1989-03-20 1990-10-02 Fujitsu Ltd Charged particle beam aligner
US5557110A (en) * 1994-01-19 1996-09-17 Nec Corporation Aperture for use in electron beam system for pattern writing
US6288407B1 (en) 1996-08-30 2001-09-11 Nec Corporation Electron beam-writing apparatus and electron beam-writing method

Also Published As

Publication number Publication date
IT7826097A0 (en) 1978-07-26
IT1112285B (en) 1986-01-13
NL7808162A (en) 1979-02-13
SE7808326L (en) 1979-02-11
FR2400256A1 (en) 1979-03-09
CH631574A5 (en) 1982-08-13
JPS5438035B2 (en) 1979-11-19
FR2400256B1 (en) 1982-02-05
SE7808326A (en) 1979-02-11
BR7804994A (en) 1979-04-17
DE2834391C2 (en) 1986-04-17
DE2834391A1 (en) 1979-02-22
SE425838B (en) 1982-11-15
GB1598219A (en) 1981-09-16

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