JPS52103967A - Method of iluminating surface of material to be machined and apparatus therefor - Google Patents

Method of iluminating surface of material to be machined and apparatus therefor

Info

Publication number
JPS52103967A
JPS52103967A JP1085877A JP1085877A JPS52103967A JP S52103967 A JPS52103967 A JP S52103967A JP 1085877 A JP1085877 A JP 1085877A JP 1085877 A JP1085877 A JP 1085877A JP S52103967 A JPS52103967 A JP S52103967A
Authority
JP
Japan
Prior art keywords
iluminating
machined
apparatus therefor
therefor
iluminating surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1085877A
Other languages
Japanese (ja)
Other versions
JPS5426875B2 (en
Inventor
Jiyakobu Koriaa Robaato
Jiyooji Robaato Tomuso Maikeru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of JPS52103967A publication Critical patent/JPS52103967A/en
Publication of JPS5426875B2 publication Critical patent/JPS5426875B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H01J2237/30488—Raster scan
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31776—Shaped beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP1085877A 1976-02-05 1977-02-04 Method of iluminating surface of material to be machined and apparatus therefor Granted JPS52103967A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US65542776A 1976-02-05 1976-02-05

Publications (2)

Publication Number Publication Date
JPS52103967A true JPS52103967A (en) 1977-08-31
JPS5426875B2 JPS5426875B2 (en) 1979-09-06

Family

ID=24628844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1085877A Granted JPS52103967A (en) 1976-02-05 1977-02-04 Method of iluminating surface of material to be machined and apparatus therefor

Country Status (5)

Country Link
JP (1) JPS52103967A (en)
CA (1) CA1149086A (en)
DE (1) DE2704441A1 (en)
FR (1) FR2340616A1 (en)
GB (1) GB1557924A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS538064A (en) * 1976-05-14 1978-01-25 Thomson Csf Particle optical device
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
JPS53124078A (en) * 1977-02-23 1978-10-30 Ibm Electron beam device
JPS5429981A (en) * 1977-08-10 1979-03-06 Ibm Device for radiating electron beam
JPS5442980A (en) * 1977-09-10 1979-04-05 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam unit
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
JPS5610926A (en) * 1979-07-06 1981-02-03 Hitachi Ltd Electron beam drawing device
JPS56134744U (en) * 1981-01-22 1981-10-13

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1100237A (en) * 1977-03-23 1981-04-28 Roger F.W. Pease Multiple electron beam exposure system
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus
JPS5829490A (en) * 1981-08-18 1983-02-21 松下電器産業株式会社 Dehydrator
JPS5845742A (en) * 1981-08-31 1983-03-17 ヘキスト・アクチエンゲゼルシヤフト Purification and recovery of contaminated catalyst solution generated in carbonization of methyl acetate and/or dimethyl ether

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus
JPS5829490A (en) * 1981-08-18 1983-02-21 松下電器産業株式会社 Dehydrator
JPS5845742A (en) * 1981-08-31 1983-03-17 ヘキスト・アクチエンゲゼルシヤフト Purification and recovery of contaminated catalyst solution generated in carbonization of methyl acetate and/or dimethyl ether

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320391B2 (en) * 1975-10-23 1978-06-26
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS538064A (en) * 1976-05-14 1978-01-25 Thomson Csf Particle optical device
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
JPS54374B2 (en) * 1976-07-30 1979-01-10
JPS53124078A (en) * 1977-02-23 1978-10-30 Ibm Electron beam device
JPS5424833B2 (en) * 1977-02-23 1979-08-23
JPS5438035B2 (en) * 1977-08-10 1979-11-19
JPS5429981A (en) * 1977-08-10 1979-03-06 Ibm Device for radiating electron beam
JPS5442980A (en) * 1977-09-10 1979-04-05 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam unit
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
JPS626341B2 (en) * 1977-10-29 1987-02-10 Nippon Avionics Co Ltd
JPS5610926A (en) * 1979-07-06 1981-02-03 Hitachi Ltd Electron beam drawing device
JPS6161251B2 (en) * 1979-07-06 1986-12-24 Hitachi Ltd
JPS56134744U (en) * 1981-01-22 1981-10-13
JPS5744684Y2 (en) * 1981-01-22 1982-10-02

Also Published As

Publication number Publication date
FR2340616A1 (en) 1977-09-02
JPS5426875B2 (en) 1979-09-06
GB1557924A (en) 1979-12-19
DE2704441A1 (en) 1977-08-11
CA1149086A (en) 1983-06-28

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