GB1557924A - Irradiation apparatus and methods - Google Patents

Irradiation apparatus and methods

Info

Publication number
GB1557924A
GB1557924A GB283677A GB283677A GB1557924A GB 1557924 A GB1557924 A GB 1557924A GB 283677 A GB283677 A GB 283677A GB 283677 A GB283677 A GB 283677A GB 1557924 A GB1557924 A GB 1557924A
Authority
GB
United Kingdom
Prior art keywords
methods
irradiation apparatus
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB283677A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1557924A publication Critical patent/GB1557924A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H01J2237/30488—Raster scan
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31776—Shaped beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
GB283677A 1976-02-05 1977-01-24 Irradiation apparatus and methods Expired GB1557924A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US65542776A 1976-02-05 1976-02-05

Publications (1)

Publication Number Publication Date
GB1557924A true GB1557924A (en) 1979-12-19

Family

ID=24628844

Family Applications (1)

Application Number Title Priority Date Filing Date
GB283677A Expired GB1557924A (en) 1976-02-05 1977-01-24 Irradiation apparatus and methods

Country Status (5)

Country Link
JP (1) JPS52103967A (en)
CA (1) CA1149086A (en)
DE (1) DE2704441A1 (en)
FR (1) FR2340616A1 (en)
GB (1) GB1557924A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
NL177578C (en) * 1976-05-14 1985-10-16 Thomson Csf DEVICE FOR DESCRIBING AN OBJECT WITH A PARTICULAR BUNDLE.
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
CA1166766A (en) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Method and apparatus for forming a variable size electron beam
CA1100237A (en) * 1977-03-23 1981-04-28 Roger F.W. Pease Multiple electron beam exposure system
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5442980A (en) * 1977-09-10 1979-04-05 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam unit
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
JPS5610926A (en) * 1979-07-06 1981-02-03 Hitachi Ltd Electron beam drawing device
JPS5744684Y2 (en) * 1981-01-22 1982-10-02

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus
JPS5829490A (en) * 1981-08-18 1983-02-21 松下電器産業株式会社 Dehydrator
DE3134348A1 (en) * 1981-08-31 1983-03-10 Hoechst Ag, 6000 Frankfurt METHOD FOR CLEANING AND RECOVERY OF THE UNCLEANED CATALYST SOLUTION RESULTING FROM CARBONYLATING METHYL ACETATE AND / OR DIMETHYL ETHER

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

Also Published As

Publication number Publication date
FR2340616A1 (en) 1977-09-02
CA1149086A (en) 1983-06-28
JPS5426875B2 (en) 1979-09-06
DE2704441A1 (en) 1977-08-11
JPS52103967A (en) 1977-08-31

Similar Documents

Publication Publication Date Title
GB1488741A (en) Irradiation apparatus and methods
JPS52106503A (en) Alignment device and method
JPS5353578A (en) Burning method and apparatus
JPS5311685A (en) Bagginncarton producing method and apparatus
JPS523887A (en) Cultivating apparatus and method
GB2011297B (en) Roller-dies-processing method and apparatus
GB1557924A (en) Irradiation apparatus and methods
ZA765614B (en) Quenching method and apparatus
GB1557354A (en) Benefication apparatus and method
AU3750478A (en) Goods-handling method and apparatus
PH12221A (en) Micro-gasometric method and apparatus
JPS5353791A (en) Method and device for szztwisting
JPS5240649A (en) Falseetwisting method and apparatus
GB1540837A (en) Dehusking apparatus and method
JPS52154534A (en) Paozu forming method and apparatus therefor
JPS522430A (en) Type photoocomposing method and device therefor
JPS52111883A (en) Method and apparatus for reducing activated energy
JPS5332793A (en) Ionization method and apparatus
IL50705A0 (en) Insect- combating device and method
GB1538431A (en) Tokens and token-freed apparatus
JPS5326772A (en) Method and apparatus for preventing dusttsticking
JPS5353192A (en) Stimulating method and device
ZA77856B (en) Packaging apparatus and methods
GB1557965A (en) Method and apparatus
JPS5331574A (en) Gassliquid contact method and its apparatus

Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee