JPS5424833B2 - - Google Patents

Info

Publication number
JPS5424833B2
JPS5424833B2 JP1548478A JP1548478A JPS5424833B2 JP S5424833 B2 JPS5424833 B2 JP S5424833B2 JP 1548478 A JP1548478 A JP 1548478A JP 1548478 A JP1548478 A JP 1548478A JP S5424833 B2 JPS5424833 B2 JP S5424833B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1548478A
Other languages
Japanese (ja)
Other versions
JPS53124078A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS53124078A publication Critical patent/JPS53124078A/en
Publication of JPS5424833B2 publication Critical patent/JPS5424833B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002Details
    • H01J37/3007Electron or ion-optical systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
JP1548478A 1977-02-23 1978-02-15 Electron beam device Granted JPS53124078A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US77123577A 1977-02-23 1977-02-23

Publications (2)

Publication Number Publication Date
JPS53124078A JPS53124078A (en) 1978-10-30
JPS5424833B2 true JPS5424833B2 (en) 1979-08-23

Family

ID=25091155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1548478A Granted JPS53124078A (en) 1977-02-23 1978-02-15 Electron beam device

Country Status (9)

Country Link
JP (1) JPS53124078A (en)
BR (1) BR7801031A (en)
CA (1) CA1166766A (en)
DE (1) DE2805371C2 (en)
FR (1) FR2382091A1 (en)
GB (1) GB1587852A (en)
IT (1) IT1158434B (en)
NL (1) NL7802010A (en)
SE (1) SE437441B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS543476A (en) * 1977-06-09 1979-01-11 Jeol Ltd Electron beam exposure device
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5679429A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron beam exposure process
EP0053225B1 (en) * 1980-11-28 1985-03-13 International Business Machines Corporation Electron beam system and method
US4423305A (en) * 1981-07-30 1983-12-27 International Business Machines Corporation Method and apparatus for controlling alignment of an electron beam of a variable shape
JPS5928336A (en) * 1982-08-09 1984-02-15 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method
CN116441562B (en) * 2023-06-16 2023-08-15 西安赛隆增材技术股份有限公司 Device and method for calibrating beam spot of electron beam

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS538064A (en) * 1976-05-14 1978-01-25 Thomson Csf Particle optical device
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6807439A (en) * 1968-05-27 1969-12-01
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
FR2351497A1 (en) * 1976-05-14 1977-12-09 Thomson Csf Corpuscular optics lens arrangement - projects image onto object by subsequent programmed drawing of picture elements onto object (NL 16.11.77)
DE2627632A1 (en) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Nonthermic electron beam machining - has radiation control by pulse impact point and beam cross section corresp. to specific section to be machined

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS538064A (en) * 1976-05-14 1978-01-25 Thomson Csf Particle optical device
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Also Published As

Publication number Publication date
SE437441B (en) 1985-02-25
DE2805371A1 (en) 1978-08-24
FR2382091B1 (en) 1982-04-09
IT1158434B (en) 1987-02-18
CA1166766A (en) 1984-05-01
GB1587852A (en) 1981-04-08
SE7801728L (en) 1978-08-24
BR7801031A (en) 1978-12-12
DE2805371C2 (en) 1984-02-16
FR2382091A1 (en) 1978-09-22
IT7820143A0 (en) 1978-02-10
JPS53124078A (en) 1978-10-30
NL7802010A (en) 1978-08-25

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