FR2382091B1 - - Google Patents
Info
- Publication number
- FR2382091B1 FR2382091B1 FR7800742A FR7800742A FR2382091B1 FR 2382091 B1 FR2382091 B1 FR 2382091B1 FR 7800742 A FR7800742 A FR 7800742A FR 7800742 A FR7800742 A FR 7800742A FR 2382091 B1 FR2382091 B1 FR 2382091B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US77123577A | 1977-02-23 | 1977-02-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2382091A1 FR2382091A1 (en) | 1978-09-22 |
| FR2382091B1 true FR2382091B1 (en) | 1982-04-09 |
Family
ID=25091155
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7800742A Granted FR2382091A1 (en) | 1977-02-23 | 1978-01-05 | METHOD AND DEVICE FOR FORMING AN ELECTRONIC HARNESS OF VARIABLE SIZE |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS53124078A (en) |
| BR (1) | BR7801031A (en) |
| CA (1) | CA1166766A (en) |
| DE (1) | DE2805371C2 (en) |
| FR (1) | FR2382091A1 (en) |
| GB (1) | GB1587852A (en) |
| IT (1) | IT1158434B (en) |
| NL (1) | NL7802010A (en) |
| SE (1) | SE437441B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS543476A (en) * | 1977-06-09 | 1979-01-11 | Jeol Ltd | Electron beam exposure device |
| GB1598219A (en) * | 1977-08-10 | 1981-09-16 | Ibm | Electron beam system |
| JPS5679429A (en) * | 1979-12-03 | 1981-06-30 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron beam exposure process |
| DE3169257D1 (en) * | 1980-11-28 | 1985-04-18 | Ibm | Electron beam system and method |
| US4423305A (en) * | 1981-07-30 | 1983-12-27 | International Business Machines Corporation | Method and apparatus for controlling alignment of an electron beam of a variable shape |
| JPS5928336A (en) * | 1982-08-09 | 1984-02-15 | Nippon Telegr & Teleph Corp <Ntt> | Pattern forming method |
| CN116441562B (en) * | 2023-06-16 | 2023-08-15 | 西安赛隆增材技术股份有限公司 | Device and method for calibrating beam spot of electron beam |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6807439A (en) * | 1968-05-27 | 1969-12-01 | ||
| US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
| US3801792A (en) * | 1973-05-23 | 1974-04-02 | Bell Telephone Labor Inc | Electron beam apparatus |
| JPS5251871A (en) * | 1975-10-23 | 1977-04-26 | Rikagaku Kenkyusho | Projecting method for charge particle beams |
| JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
| GB1557924A (en) * | 1976-02-05 | 1979-12-19 | Western Electric Co | Irradiation apparatus and methods |
| NL177578C (en) * | 1976-05-14 | 1985-10-16 | Thomson Csf | DEVICE FOR DESCRIBING AN OBJECT WITH A PARTICULAR BUNDLE. |
| FR2351497A1 (en) * | 1976-05-14 | 1977-12-09 | Thomson Csf | Corpuscular optics lens arrangement - projects image onto object by subsequent programmed drawing of picture elements onto object (NL 16.11.77) |
| DE2627632A1 (en) * | 1976-06-19 | 1977-12-22 | Jenoptik Jena Gmbh | Nonthermic electron beam machining - has radiation control by pulse impact point and beam cross section corresp. to specific section to be machined |
| JPS5320391A (en) * | 1976-08-09 | 1978-02-24 | Becton Dickinson Co | Blood inspection apparatus |
-
1977
- 1977-11-29 CA CA000291957A patent/CA1166766A/en not_active Expired
-
1978
- 1978-01-05 FR FR7800742A patent/FR2382091A1/en active Granted
- 1978-01-20 GB GB2456/78A patent/GB1587852A/en not_active Expired
- 1978-02-09 DE DE2805371A patent/DE2805371C2/en not_active Expired
- 1978-02-10 IT IT20143/78A patent/IT1158434B/en active
- 1978-02-15 JP JP1548478A patent/JPS53124078A/en active Granted
- 1978-02-15 SE SE7801728A patent/SE437441B/en not_active IP Right Cessation
- 1978-02-21 BR BR7801031A patent/BR7801031A/en unknown
- 1978-02-22 NL NL7802010A patent/NL7802010A/en not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| FR2382091A1 (en) | 1978-09-22 |
| BR7801031A (en) | 1978-12-12 |
| IT7820143A0 (en) | 1978-02-10 |
| JPS53124078A (en) | 1978-10-30 |
| NL7802010A (en) | 1978-08-25 |
| JPS5424833B2 (en) | 1979-08-23 |
| SE437441B (en) | 1985-02-25 |
| DE2805371A1 (en) | 1978-08-24 |
| CA1166766A (en) | 1984-05-01 |
| DE2805371C2 (en) | 1984-02-16 |
| GB1587852A (en) | 1981-04-08 |
| IT1158434B (en) | 1987-02-18 |
| SE7801728L (en) | 1978-08-24 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |