NL7802010A - METHOD AND DEVICE FOR FORMING AN ELECTRONIC BEAM WITH VARIABLE DIMENSIONS. - Google Patents

METHOD AND DEVICE FOR FORMING AN ELECTRONIC BEAM WITH VARIABLE DIMENSIONS.

Info

Publication number
NL7802010A
NL7802010A NL7802010A NL7802010A NL7802010A NL 7802010 A NL7802010 A NL 7802010A NL 7802010 A NL7802010 A NL 7802010A NL 7802010 A NL7802010 A NL 7802010A NL 7802010 A NL7802010 A NL 7802010A
Authority
NL
Netherlands
Prior art keywords
forming
electronic beam
variable dimensions
dimensions
variable
Prior art date
Application number
NL7802010A
Other languages
Dutch (nl)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of NL7802010A publication Critical patent/NL7802010A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
NL7802010A 1977-02-23 1978-02-22 METHOD AND DEVICE FOR FORMING AN ELECTRONIC BEAM WITH VARIABLE DIMENSIONS. NL7802010A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US77123577A 1977-02-23 1977-02-23

Publications (1)

Publication Number Publication Date
NL7802010A true NL7802010A (en) 1978-08-25

Family

ID=25091155

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7802010A NL7802010A (en) 1977-02-23 1978-02-22 METHOD AND DEVICE FOR FORMING AN ELECTRONIC BEAM WITH VARIABLE DIMENSIONS.

Country Status (9)

Country Link
JP (1) JPS53124078A (en)
BR (1) BR7801031A (en)
CA (1) CA1166766A (en)
DE (1) DE2805371C2 (en)
FR (1) FR2382091A1 (en)
GB (1) GB1587852A (en)
IT (1) IT1158434B (en)
NL (1) NL7802010A (en)
SE (1) SE437441B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS543476A (en) * 1977-06-09 1979-01-11 Jeol Ltd Electron beam exposure device
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5679429A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron beam exposure process
DE3169257D1 (en) * 1980-11-28 1985-04-18 Ibm Electron beam system and method
US4423305A (en) * 1981-07-30 1983-12-27 International Business Machines Corporation Method and apparatus for controlling alignment of an electron beam of a variable shape
JPS5928336A (en) * 1982-08-09 1984-02-15 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method
CN116441562B (en) * 2023-06-16 2023-08-15 西安赛隆增材技术股份有限公司 Device and method for calibrating beam spot of electron beam

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6807439A (en) * 1968-05-27 1969-12-01
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
GB1557924A (en) * 1976-02-05 1979-12-19 Western Electric Co Irradiation apparatus and methods
FR2351497A1 (en) * 1976-05-14 1977-12-09 Thomson Csf Corpuscular optics lens arrangement - projects image onto object by subsequent programmed drawing of picture elements onto object (NL 16.11.77)
NL177578C (en) * 1976-05-14 1985-10-16 Thomson Csf DEVICE FOR DESCRIBING AN OBJECT WITH A PARTICULAR BUNDLE.
DE2627632A1 (en) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Nonthermic electron beam machining - has radiation control by pulse impact point and beam cross section corresp. to specific section to be machined
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Also Published As

Publication number Publication date
SE437441B (en) 1985-02-25
JPS53124078A (en) 1978-10-30
BR7801031A (en) 1978-12-12
JPS5424833B2 (en) 1979-08-23
IT1158434B (en) 1987-02-18
SE7801728L (en) 1978-08-24
FR2382091B1 (en) 1982-04-09
DE2805371A1 (en) 1978-08-24
GB1587852A (en) 1981-04-08
FR2382091A1 (en) 1978-09-22
CA1166766A (en) 1984-05-01
IT7820143A0 (en) 1978-02-10
DE2805371C2 (en) 1984-02-16

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
A85 Still pending on 85-01-01
BC A request for examination has been filed
BV The patent application has lapsed