SE7808326A - ELECTRONRAL ARRANGEMENTS - Google Patents

ELECTRONRAL ARRANGEMENTS

Info

Publication number
SE7808326A
SE7808326A SE7808326A SE7808326A SE7808326A SE 7808326 A SE7808326 A SE 7808326A SE 7808326 A SE7808326 A SE 7808326A SE 7808326 A SE7808326 A SE 7808326A SE 7808326 A SE7808326 A SE 7808326A
Authority
SE
Sweden
Prior art keywords
patterns
electronral
arrangements
recur
imaged
Prior art date
Application number
SE7808326A
Other languages
Swedish (sv)
Other versions
SE425838B (en
SE7808326L (en
Inventor
H C Pfeiffer
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of SE7808326L publication Critical patent/SE7808326L/en
Publication of SE7808326A publication Critical patent/SE7808326A/en
Publication of SE425838B publication Critical patent/SE425838B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path

Abstract

The electron beam device for pattern projection is particularly suitable for producing integrated semiconductor appliances. The device comprises beam-forming apertures (13, 17), which are in the beam path downstream of the beam source (10), for projecting characters or parts of a pattern onto a target. The appliance allows up to 1600 pixels to be addressed simultaneously and patterns, especially patterns which recur very frequently, to be imaged at high speed. <IMAGE>
SE7808326A 1977-08-10 1978-08-02 ELEKTRONSTRALE arrangement SE425838B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82335277A 1977-08-10 1977-08-10

Publications (3)

Publication Number Publication Date
SE7808326L SE7808326L (en) 1979-02-11
SE7808326A true SE7808326A (en) 1979-02-11
SE425838B SE425838B (en) 1982-11-15

Family

ID=25238513

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7808326A SE425838B (en) 1977-08-10 1978-08-02 ELEKTRONSTRALE arrangement

Country Status (9)

Country Link
JP (1) JPS5429981A (en)
BR (1) BR7804994A (en)
CH (1) CH631574A5 (en)
DE (1) DE2834391C2 (en)
FR (1) FR2400256A1 (en)
GB (1) GB1598219A (en)
IT (1) IT1112285B (en)
NL (1) NL7808162A (en)
SE (1) SE425838B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5435173U (en) * 1977-08-12 1979-03-07
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
FR2488043A1 (en) * 1980-07-30 1982-02-05 Le N Proizv Probe dia. variation device for electron beam analysis - uses two beam deflectors and has fixed multi-aperture plate
JPS57206173A (en) * 1981-06-15 1982-12-17 Nippon Telegr & Teleph Corp <Ntt> Focusing deflecting device for charged corpuscule beam
JPS61183926A (en) * 1985-02-08 1986-08-16 Toshiba Corp Charged beam irradiation unit
JPS62206828A (en) * 1986-03-06 1987-09-11 Nec Corp Charged-particle beam lithography device
JPH02246318A (en) * 1989-03-20 1990-10-02 Fujitsu Ltd Charged particle beam aligner
JP2746098B2 (en) * 1994-01-19 1998-04-28 日本電気株式会社 Aperture for electron beam writing and electron beam writing method
JP3206448B2 (en) 1996-08-30 2001-09-10 日本電気株式会社 Electron beam lithography system

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
DE2460716C2 (en) * 1974-12-19 1976-12-30 Siemens Ag BODY RAY OPTICAL DEVICE FOR BODY RADIATION OF A PREPARATION
US3956635A (en) * 1975-06-13 1976-05-11 International Business Machines Corporation Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
GB1557924A (en) * 1976-02-05 1979-12-19 Western Electric Co Irradiation apparatus and methods
FR2351497A1 (en) * 1976-05-14 1977-12-09 Thomson Csf Corpuscular optics lens arrangement - projects image onto object by subsequent programmed drawing of picture elements onto object (NL 16.11.77)
JPS5357764A (en) * 1976-11-04 1978-05-25 Fujitsu Ltd Electron beam exposure apparatus
CA1166766A (en) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Method and apparatus for forming a variable size electron beam
US4182958A (en) * 1977-05-31 1980-01-08 Rikagaku Kenkyusho Method and apparatus for projecting a beam of electrically charged particles

Also Published As

Publication number Publication date
SE425838B (en) 1982-11-15
FR2400256B1 (en) 1982-02-05
IT1112285B (en) 1986-01-13
DE2834391A1 (en) 1979-02-22
NL7808162A (en) 1979-02-13
GB1598219A (en) 1981-09-16
BR7804994A (en) 1979-04-17
DE2834391C2 (en) 1986-04-17
FR2400256A1 (en) 1979-03-09
SE7808326L (en) 1979-02-11
IT7826097A0 (en) 1978-07-26
JPS5429981A (en) 1979-03-06
JPS5438035B2 (en) 1979-11-19
CH631574A5 (en) 1982-08-13

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