JPS52139381A - Electron beam exposure apparatus - Google Patents
Electron beam exposure apparatusInfo
- Publication number
- JPS52139381A JPS52139381A JP5607876A JP5607876A JPS52139381A JP S52139381 A JPS52139381 A JP S52139381A JP 5607876 A JP5607876 A JP 5607876A JP 5607876 A JP5607876 A JP 5607876A JP S52139381 A JPS52139381 A JP S52139381A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure apparatus
- beam exposure
- moving
- specimen base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To draw patterns and reduce the moving time of a specimen base by moving the specimen base in such a manner that even if the specimen base is moving it seems as if it is in standstill when viewed from an electron beam radiation system.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5607876A JPS52139381A (en) | 1976-05-18 | 1976-05-18 | Electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5607876A JPS52139381A (en) | 1976-05-18 | 1976-05-18 | Electron beam exposure apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52139381A true JPS52139381A (en) | 1977-11-21 |
JPS5413353B2 JPS5413353B2 (en) | 1979-05-30 |
Family
ID=13017040
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5607876A Granted JPS52139381A (en) | 1976-05-18 | 1976-05-18 | Electron beam exposure apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52139381A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54117685A (en) * | 1978-03-03 | 1979-09-12 | Toshiba Corp | Electron beam exposure unit |
JPS54175274U (en) * | 1978-05-30 | 1979-12-11 | ||
JPS54175275U (en) * | 1978-05-30 | 1979-12-11 | ||
JPS553603A (en) * | 1978-06-21 | 1980-01-11 | Toshiba Corp | Electron beam exposure device |
JPS5552223A (en) * | 1978-10-13 | 1980-04-16 | Nippon Telegr & Teleph Corp <Ntt> | Exposure method in electronic beam exposure device |
JPS5657037A (en) * | 1979-10-15 | 1981-05-19 | Fujitsu Ltd | Projection exposing method |
JPS5891638A (en) * | 1981-11-26 | 1983-05-31 | Fujitsu Ltd | Method for electron beam exposure |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3900737A (en) * | 1974-04-18 | 1975-08-19 | Bell Telephone Labor Inc | Electron beam exposure system |
-
1976
- 1976-05-18 JP JP5607876A patent/JPS52139381A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3900737A (en) * | 1974-04-18 | 1975-08-19 | Bell Telephone Labor Inc | Electron beam exposure system |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54117685A (en) * | 1978-03-03 | 1979-09-12 | Toshiba Corp | Electron beam exposure unit |
JPS5620692B2 (en) * | 1978-03-03 | 1981-05-15 | ||
JPS54175274U (en) * | 1978-05-30 | 1979-12-11 | ||
JPS54175275U (en) * | 1978-05-30 | 1979-12-11 | ||
JPS553603A (en) * | 1978-06-21 | 1980-01-11 | Toshiba Corp | Electron beam exposure device |
JPS6226172B2 (en) * | 1978-06-21 | 1987-06-08 | Tokyo Shibaura Electric Co | |
JPS5552223A (en) * | 1978-10-13 | 1980-04-16 | Nippon Telegr & Teleph Corp <Ntt> | Exposure method in electronic beam exposure device |
JPS5657037A (en) * | 1979-10-15 | 1981-05-19 | Fujitsu Ltd | Projection exposing method |
JPS5891638A (en) * | 1981-11-26 | 1983-05-31 | Fujitsu Ltd | Method for electron beam exposure |
Also Published As
Publication number | Publication date |
---|---|
JPS5413353B2 (en) | 1979-05-30 |
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