JPS52139381A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS52139381A
JPS52139381A JP5607876A JP5607876A JPS52139381A JP S52139381 A JPS52139381 A JP S52139381A JP 5607876 A JP5607876 A JP 5607876A JP 5607876 A JP5607876 A JP 5607876A JP S52139381 A JPS52139381 A JP S52139381A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
beam exposure
moving
specimen base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5607876A
Other languages
Japanese (ja)
Other versions
JPS5413353B2 (en
Inventor
Masahiko Washimi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5607876A priority Critical patent/JPS52139381A/en
Publication of JPS52139381A publication Critical patent/JPS52139381A/en
Publication of JPS5413353B2 publication Critical patent/JPS5413353B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To draw patterns and reduce the moving time of a specimen base by moving the specimen base in such a manner that even if the specimen base is moving it seems as if it is in standstill when viewed from an electron beam radiation system.
COPYRIGHT: (C)1977,JPO&Japio
JP5607876A 1976-05-18 1976-05-18 Electron beam exposure apparatus Granted JPS52139381A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5607876A JPS52139381A (en) 1976-05-18 1976-05-18 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5607876A JPS52139381A (en) 1976-05-18 1976-05-18 Electron beam exposure apparatus

Publications (2)

Publication Number Publication Date
JPS52139381A true JPS52139381A (en) 1977-11-21
JPS5413353B2 JPS5413353B2 (en) 1979-05-30

Family

ID=13017040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5607876A Granted JPS52139381A (en) 1976-05-18 1976-05-18 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS52139381A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54117685A (en) * 1978-03-03 1979-09-12 Toshiba Corp Electron beam exposure unit
JPS54175274U (en) * 1978-05-30 1979-12-11
JPS54175275U (en) * 1978-05-30 1979-12-11
JPS553603A (en) * 1978-06-21 1980-01-11 Toshiba Corp Electron beam exposure device
JPS5552223A (en) * 1978-10-13 1980-04-16 Nippon Telegr & Teleph Corp <Ntt> Exposure method in electronic beam exposure device
JPS5657037A (en) * 1979-10-15 1981-05-19 Fujitsu Ltd Projection exposing method
JPS5891638A (en) * 1981-11-26 1983-05-31 Fujitsu Ltd Method for electron beam exposure

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3900737A (en) * 1974-04-18 1975-08-19 Bell Telephone Labor Inc Electron beam exposure system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3900737A (en) * 1974-04-18 1975-08-19 Bell Telephone Labor Inc Electron beam exposure system

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54117685A (en) * 1978-03-03 1979-09-12 Toshiba Corp Electron beam exposure unit
JPS5620692B2 (en) * 1978-03-03 1981-05-15
JPS54175274U (en) * 1978-05-30 1979-12-11
JPS54175275U (en) * 1978-05-30 1979-12-11
JPS553603A (en) * 1978-06-21 1980-01-11 Toshiba Corp Electron beam exposure device
JPS6226172B2 (en) * 1978-06-21 1987-06-08 Tokyo Shibaura Electric Co
JPS5552223A (en) * 1978-10-13 1980-04-16 Nippon Telegr & Teleph Corp <Ntt> Exposure method in electronic beam exposure device
JPS5657037A (en) * 1979-10-15 1981-05-19 Fujitsu Ltd Projection exposing method
JPS5891638A (en) * 1981-11-26 1983-05-31 Fujitsu Ltd Method for electron beam exposure

Also Published As

Publication number Publication date
JPS5413353B2 (en) 1979-05-30

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