JPS54117685A - Electron beam exposure unit - Google Patents

Electron beam exposure unit

Info

Publication number
JPS54117685A
JPS54117685A JP2424678A JP2424678A JPS54117685A JP S54117685 A JPS54117685 A JP S54117685A JP 2424678 A JP2424678 A JP 2424678A JP 2424678 A JP2424678 A JP 2424678A JP S54117685 A JPS54117685 A JP S54117685A
Authority
JP
Japan
Prior art keywords
movement
change
electron beam
deltay
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2424678A
Other languages
Japanese (ja)
Other versions
JPS5620692B2 (en
Inventor
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2424678A priority Critical patent/JPS54117685A/en
Publication of JPS54117685A publication Critical patent/JPS54117685A/en
Publication of JPS5620692B2 publication Critical patent/JPS5620692B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To correct the deflection direction of electron beam with a good following property by detecting the change of the movement velocity of a table in real time. CONSTITUTION:After moving in the +y direction by L, table 9 moves in the x direction by l in steps; and after moving in the -y direction by L, table 9 moves by l in steps to perform a beam exposure. The brightness dependent upon the movement of the table is converted photoelectrically by laser reflector 11 and laser interference meter 12 and is counted in 13 and is operated in 14 to calculate the movement velocity of the table and the velocity change. Correcting components DELTAy and DELTA<2>y are obtained from these values to control deflection through interface 15 by controller 16. Controller 16 applies a prescribed voltage to deflecting plates 6 and 7 synchronously with the movement of the table. Thus, a very accurate beam scanning without pattern slippage DELTAy and change components DELTA<2>y of it is performed.
JP2424678A 1978-03-03 1978-03-03 Electron beam exposure unit Granted JPS54117685A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2424678A JPS54117685A (en) 1978-03-03 1978-03-03 Electron beam exposure unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2424678A JPS54117685A (en) 1978-03-03 1978-03-03 Electron beam exposure unit

Publications (2)

Publication Number Publication Date
JPS54117685A true JPS54117685A (en) 1979-09-12
JPS5620692B2 JPS5620692B2 (en) 1981-05-15

Family

ID=12132886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2424678A Granted JPS54117685A (en) 1978-03-03 1978-03-03 Electron beam exposure unit

Country Status (1)

Country Link
JP (1) JPS54117685A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5657037A (en) * 1979-10-15 1981-05-19 Fujitsu Ltd Projection exposing method
EP0047989A2 (en) * 1980-09-17 1982-03-24 Kabushiki Kaisha Toshiba Electron beam exposure system
JPS5752612U (en) * 1980-09-09 1982-03-26
JPS5810829A (en) * 1981-07-06 1983-01-21 エテック・システムズ・インコーポレイテッド Method of producing microminiature device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22
JPS52139381A (en) * 1976-05-18 1977-11-21 Toshiba Corp Electron beam exposure apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22
JPS52139381A (en) * 1976-05-18 1977-11-21 Toshiba Corp Electron beam exposure apparatus

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5657037A (en) * 1979-10-15 1981-05-19 Fujitsu Ltd Projection exposing method
JPS5752612U (en) * 1980-09-09 1982-03-26
JPH0116934Y2 (en) * 1980-09-09 1989-05-17
EP0047989A2 (en) * 1980-09-17 1982-03-24 Kabushiki Kaisha Toshiba Electron beam exposure system
JPS5753938A (en) * 1980-09-17 1982-03-31 Toshiba Corp Electron beam exposure apparatus
JPS631743B2 (en) * 1980-09-17 1988-01-13 Tokyo Shibaura Electric Co
JPS5810829A (en) * 1981-07-06 1983-01-21 エテック・システムズ・インコーポレイテッド Method of producing microminiature device
JPH0468768B2 (en) * 1981-07-06 1992-11-04 Etetsuku Shisutemuzu Inc

Also Published As

Publication number Publication date
JPS5620692B2 (en) 1981-05-15

Similar Documents

Publication Publication Date Title
JPS57138757A (en) Correction of deflection distortion
JPS5731134A (en) Drawing device by electron beam
JPS54117685A (en) Electron beam exposure unit
JPS6410106A (en) Alignment device
JPS5753938A (en) Electron beam exposure apparatus
JPS56126927A (en) Exposure method by electron beam
JPS52130570A (en) Electron beam exposing device
JPS54109382A (en) Electron ray exposure
JPS53120277A (en) Electron beam exposure device
JPS52103966A (en) Deflection unit for charged particle ray exposure device
JPS522381A (en) Electronics beam deflection scanning method
JPS56147437A (en) Electron beam exposure method
JPS57208140A (en) Method of adjusting electron beam exposure apparatus
JPS54148381A (en) Electron beam exposure method
JPS56105633A (en) Inspection device of mask for electron beam
JPS5240163A (en) Measurement method
JPS5572033A (en) Electron beam exposure device
JPS5621324A (en) X-ray generator
JPS5480027A (en) Deflection control unit
JPS53106162A (en) Electron beam meter
JPS5760838A (en) Exposure for electron beam
JPS5648135A (en) Painting for electron beam and device therefor
JPS5572032A (en) Electron beam exposure device
JPS5279662A (en) Electron beam exposure device
JPS5750432A (en) Drawing method by electron beam