JPS5648135A - Painting for electron beam and device therefor - Google Patents

Painting for electron beam and device therefor

Info

Publication number
JPS5648135A
JPS5648135A JP12396979A JP12396979A JPS5648135A JP S5648135 A JPS5648135 A JP S5648135A JP 12396979 A JP12396979 A JP 12396979A JP 12396979 A JP12396979 A JP 12396979A JP S5648135 A JPS5648135 A JP S5648135A
Authority
JP
Japan
Prior art keywords
pattern
apparent
distance
position
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12396979A
Inventor
Fumio Mizuno
Original Assignee
Chiyou Lsi Gijutsu Kenkyu Kumiai
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chiyou Lsi Gijutsu Kenkyu Kumiai filed Critical Chiyou Lsi Gijutsu Kenkyu Kumiai
Priority to JP12396979A priority Critical patent/JPS5648135A/en
Publication of JPS5648135A publication Critical patent/JPS5648135A/en
Application status is Pending legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration

Abstract

PURPOSE:To attempt the improvement of the position of a painting pattern and the accuracy of a dimension by controlling and varying the diameter of an electron beam, current, and scanning speed based on the detection value of apparent distance between mark alignments. CONSTITUTION:A power source 8 is controlled based on a detection signal 16 and the diameter of an electron beam 2 is varied in roughly proportion to the distance lax between apparent mark alignments when a wafer 6 warps and part of the field inclines and the wafer is not set at a focusing position to vary the distance of an apparent mark 13. At that time, deflecting electrodes 7 will not entirely be affected and a high-accuracy pattern position will be secured. Therefore, the beam will paint in the beam diameter in accordance with the distance between apparent mark alignments at a predetermined pattern position. Therefore, a pattern with regular width will be painted on the wafer 6 though apparent pattern width differs from the designed dimension. In this composition, a pattern position and the accuracy of the dimension will be improved.
JP12396979A 1979-09-28 1979-09-28 Painting for electron beam and device therefor Pending JPS5648135A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12396979A JPS5648135A (en) 1979-09-28 1979-09-28 Painting for electron beam and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12396979A JPS5648135A (en) 1979-09-28 1979-09-28 Painting for electron beam and device therefor

Publications (1)

Publication Number Publication Date
JPS5648135A true JPS5648135A (en) 1981-05-01

Family

ID=14873790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12396979A Pending JPS5648135A (en) 1979-09-28 1979-09-28 Painting for electron beam and device therefor

Country Status (1)

Country Link
JP (1) JPS5648135A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57163445A (en) * 1981-02-23 1982-10-07 Nabisco Brands Inc Simultaneously extruded chewing gum having soft gum core

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5254377A (en) * 1975-10-30 1977-05-02 Toshiba Corp Electron beam exposure method
JPS54112173A (en) * 1978-02-13 1979-09-01 Ibm Electron beam system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5254377A (en) * 1975-10-30 1977-05-02 Toshiba Corp Electron beam exposure method
JPS54112173A (en) * 1978-02-13 1979-09-01 Ibm Electron beam system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57163445A (en) * 1981-02-23 1982-10-07 Nabisco Brands Inc Simultaneously extruded chewing gum having soft gum core

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