JPS5657037A - Projection exposing method - Google Patents

Projection exposing method

Info

Publication number
JPS5657037A
JPS5657037A JP13273379A JP13273379A JPS5657037A JP S5657037 A JPS5657037 A JP S5657037A JP 13273379 A JP13273379 A JP 13273379A JP 13273379 A JP13273379 A JP 13273379A JP S5657037 A JPS5657037 A JP S5657037A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
film
resist
pulse
pulse width
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13273379A
Inventor
Kenji Nakagawa
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To carry out direct exposure in a short time and promote efficiency by projection-transferring a pattern onto a film with laser beam pulse including the sensitive wavelength region of the film while continuously moving the film in a direction perpendicular to the optical axis.
CONSTITUTION: In the manufacture of a photomask or a master mask used for manufacturing a semiconductor device, a resist film is formed on a Cr thin film, and while continuously moving the thin film in a direction perpendicular to the optical axis, the pattern is printed with pulse of N2 gas laser or the like. A laser light source including the sensitive wavelength region of the resist is selected. The pulse width of laser beams is set to about 10W30ns short time in which the distance of the resist film moved within the pulse width time is negligible to the exposure size, and the pulse output is set to such a degree that the resist is well exposed at the pulse width.
COPYRIGHT: (C)1981,JPO&Japio
JP13273379A 1979-10-15 1979-10-15 Projection exposing method Pending JPS5657037A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13273379A JPS5657037A (en) 1979-10-15 1979-10-15 Projection exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13273379A JPS5657037A (en) 1979-10-15 1979-10-15 Projection exposing method

Publications (1)

Publication Number Publication Date
JPS5657037A true true JPS5657037A (en) 1981-05-19

Family

ID=15088314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13273379A Pending JPS5657037A (en) 1979-10-15 1979-10-15 Projection exposing method

Country Status (1)

Country Link
JP (1) JPS5657037A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7398658B2 (en) * 2000-07-20 2008-07-15 David Benderly Gemstone marking system and method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52139381A (en) * 1976-05-18 1977-11-21 Toshiba Corp Electron beam exposure apparatus
JPS54117685A (en) * 1978-03-03 1979-09-12 Toshiba Corp Electron beam exposure unit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52139381A (en) * 1976-05-18 1977-11-21 Toshiba Corp Electron beam exposure apparatus
JPS54117685A (en) * 1978-03-03 1979-09-12 Toshiba Corp Electron beam exposure unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7398658B2 (en) * 2000-07-20 2008-07-15 David Benderly Gemstone marking system and method

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