JPS5621324A - X-ray generator - Google Patents

X-ray generator

Info

Publication number
JPS5621324A
JPS5621324A JP9711579A JP9711579A JPS5621324A JP S5621324 A JPS5621324 A JP S5621324A JP 9711579 A JP9711579 A JP 9711579A JP 9711579 A JP9711579 A JP 9711579A JP S5621324 A JPS5621324 A JP S5621324A
Authority
JP
Japan
Prior art keywords
target
changed
lengthen
lifetime
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9711579A
Other languages
Japanese (ja)
Other versions
JPS6155731B2 (en
Inventor
Masahiro Okabe
Yoshitaka Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9711579A priority Critical patent/JPS5621324A/en
Publication of JPS5621324A publication Critical patent/JPS5621324A/en
Publication of JPS6155731B2 publication Critical patent/JPS6155731B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To lengthen the lifetime of a target, by using the various sections of the identical target. CONSTITUTION:The position of a rotary target 10 can be changed in the axial direction. When the position of the target is altered to another one shown by a dotted line in the figure, the position of a ray source to a sample 20 is changed from C to C'. An applied voltage to a deflection plate 17 is set at an appropriate level to change the incident angle of an electron beam 3 to the target as shown by another dotted line to maintain an identical straight path from the position of the ray source toward the sample 20. The track on the target 10 irradiated with the electron beam 3 can thus be changed to lengthen the lifetime of the target.
JP9711579A 1979-07-30 1979-07-30 X-ray generator Granted JPS5621324A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9711579A JPS5621324A (en) 1979-07-30 1979-07-30 X-ray generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9711579A JPS5621324A (en) 1979-07-30 1979-07-30 X-ray generator

Publications (2)

Publication Number Publication Date
JPS5621324A true JPS5621324A (en) 1981-02-27
JPS6155731B2 JPS6155731B2 (en) 1986-11-28

Family

ID=14183565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9711579A Granted JPS5621324A (en) 1979-07-30 1979-07-30 X-ray generator

Country Status (1)

Country Link
JP (1) JPS5621324A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178325A (en) * 1981-04-28 1982-11-02 Nec Corp X-ray exposer
JP2011508402A (en) * 2007-12-31 2011-03-10 ゼネラル・エレクトリック・カンパニイ Movable high flux X-ray target and assembly
JP2011520233A (en) * 2008-05-09 2011-07-14 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Integrated actuator means for performing translational and / or rotational displacement movements of at least one X-ray radiation radiating the focal spot of the anode relative to a fixed reference position; and a resulting parallel and X-ray diagnostic system comprising means for compensating for angle shifts

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5271185A (en) * 1975-12-11 1977-06-14 Toshiba Corp Rotating anode x-ray tube

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5271185A (en) * 1975-12-11 1977-06-14 Toshiba Corp Rotating anode x-ray tube

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178325A (en) * 1981-04-28 1982-11-02 Nec Corp X-ray exposer
JPH0353740B2 (en) * 1981-04-28 1991-08-16
JP2011508402A (en) * 2007-12-31 2011-03-10 ゼネラル・エレクトリック・カンパニイ Movable high flux X-ray target and assembly
US8379798B2 (en) 2007-12-31 2013-02-19 General Electric Company Moving high flux X-ray target and assembly
JP2011520233A (en) * 2008-05-09 2011-07-14 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Integrated actuator means for performing translational and / or rotational displacement movements of at least one X-ray radiation radiating the focal spot of the anode relative to a fixed reference position; and a resulting parallel and X-ray diagnostic system comprising means for compensating for angle shifts

Also Published As

Publication number Publication date
JPS6155731B2 (en) 1986-11-28

Similar Documents

Publication Publication Date Title
JPS5568056A (en) X-ray tube
ATE151568T1 (en) X-RAY TUBE
JPS5516321A (en) Electrostatic radiant type electronic gun
JPS5275996A (en) X-ray tube for analysis
JPS5621324A (en) X-ray generator
JPS53103392A (en) Tomograph
JPS5536990A (en) Apparatus for applying electron beam
JPS52103966A (en) Deflection unit for charged particle ray exposure device
JPS52129394A (en) X-ray generator
JPS6455375A (en) Device for projecting ion beam
JPS5234690A (en) Method to obatain x-ray body axis tomogramic image
JPS52127060A (en) Feald emission type electron gun
JPS54143089A (en) X-ray generator
JPS546484A (en) Radiant ray generator
JPS5397387A (en) X-ray tube
JPS5359390A (en) Triple-pole x-ray tube
JPS5353975A (en) Electronic beam exposure device
JPS5750758A (en) Scan type electron microscope
JPS54143088A (en) X-ray generator
JPS52127088A (en) X-ray tube
REICHLE Development and construction of a pilot processor for electron curing[Final Report, Dec. 1980]
JPS556737A (en) Scan electron microscope
JPS5638742A (en) Camera tube
JPS5486262A (en) Electron beam device
JPS51112261A (en) Field emission electron gun