JPS5536990A - Apparatus for applying electron beam - Google Patents

Apparatus for applying electron beam

Info

Publication number
JPS5536990A
JPS5536990A JP9002879A JP9002879A JPS5536990A JP S5536990 A JPS5536990 A JP S5536990A JP 9002879 A JP9002879 A JP 9002879A JP 9002879 A JP9002879 A JP 9002879A JP S5536990 A JPS5536990 A JP S5536990A
Authority
JP
Japan
Prior art keywords
focus
electron beam
amplitude
coil
controlling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9002879A
Other languages
Japanese (ja)
Other versions
JPS5734650B2 (en
Inventor
Tadahiro Takigawa
Shizuo Kimoto
Tadao Suganuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ERIONIKUSU KK
Toshiba Corp
Original Assignee
ERIONIKUSU KK
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ERIONIKUSU KK, Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical ERIONIKUSU KK
Priority to JP9002879A priority Critical patent/JPS5536990A/en
Publication of JPS5536990A publication Critical patent/JPS5536990A/en
Publication of JPS5734650B2 publication Critical patent/JPS5734650B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)

Abstract

PURPOSE: To relieve necessities to moving toleration area in Z direction of material surface by controlling to keep the focus of the electron beam in fixed relation with material surface to be applied and controlling the amplitude of the beam fixedly.
CONSTITUTION: Electron beam 1 is focussed on surface of material 4 through coil 3. Z direction driving mechanism 6 as well as inside x-y driving mechanism is disposed on a stand 5 mounting the material 4. Surface position of the material near beam applying point is detected by Z direction detector 7 such as laser interference meter to control the mechanism 6 and to control the position in Z direction due to make beam focus on the surface. Or, by the output of detector 7, current of the coil 3 is controlled at 8 to coincide the focus with surface of the material 4. At the same time, by the result of detection, a beam deflecting inclination plate 10a is controlled to fix the amplitude of beam on the surface of material 4. Thus, as the half-vertical angle can be enlarged, by applying high energy density, shortening of working time and improvement of stabilization of the apparatus is obtained.
COPYRIGHT: (C)1980,JPO&Japio
JP9002879A 1979-07-16 1979-07-16 Apparatus for applying electron beam Granted JPS5536990A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9002879A JPS5536990A (en) 1979-07-16 1979-07-16 Apparatus for applying electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9002879A JPS5536990A (en) 1979-07-16 1979-07-16 Apparatus for applying electron beam

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP1977276A Division JPS52103965A (en) 1976-02-25 1976-02-25 Electron beam projector unit

Publications (2)

Publication Number Publication Date
JPS5536990A true JPS5536990A (en) 1980-03-14
JPS5734650B2 JPS5734650B2 (en) 1982-07-24

Family

ID=13987215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9002879A Granted JPS5536990A (en) 1979-07-16 1979-07-16 Apparatus for applying electron beam

Country Status (1)

Country Link
JP (1) JPS5536990A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5787131A (en) * 1980-11-20 1982-05-31 Jeol Ltd Exposing method of electron beam
JPS58119642A (en) * 1981-12-31 1983-07-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Automatic electron beam focusing device
JPS58145122A (en) * 1982-02-23 1983-08-29 Jeol Ltd Electron beam exposure device
JPS59150422A (en) * 1983-01-31 1984-08-28 Fujitsu Ltd Exposure process
JPS6045022A (en) * 1983-08-23 1985-03-11 Toshiba Corp Correction of height at lsi manufacturing device
JPS6355936A (en) * 1986-08-27 1988-03-10 Omron Tateisi Electronics Co Electron beam lithography device
JPH01268122A (en) * 1988-04-20 1989-10-25 Fujitsu Ltd Electron beam exposure device
US6440200B1 (en) 2000-06-23 2002-08-27 Aisan Kogyo Kabushiki Kaisha Evaporated fuel discharge preventing apparatus

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5787131A (en) * 1980-11-20 1982-05-31 Jeol Ltd Exposing method of electron beam
JPS6320376B2 (en) * 1980-11-20 1988-04-27 Nippon Electron Optics Lab
JPS58119642A (en) * 1981-12-31 1983-07-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Automatic electron beam focusing device
JPS58145122A (en) * 1982-02-23 1983-08-29 Jeol Ltd Electron beam exposure device
JPS59150422A (en) * 1983-01-31 1984-08-28 Fujitsu Ltd Exposure process
JPH0352210B2 (en) * 1983-01-31 1991-08-09 Fujitsu Ltd
JPS6045022A (en) * 1983-08-23 1985-03-11 Toshiba Corp Correction of height at lsi manufacturing device
JPH0449257B2 (en) * 1983-08-23 1992-08-11 Tokyo Shibaura Electric Co
JPS6355936A (en) * 1986-08-27 1988-03-10 Omron Tateisi Electronics Co Electron beam lithography device
JPH01268122A (en) * 1988-04-20 1989-10-25 Fujitsu Ltd Electron beam exposure device
US6440200B1 (en) 2000-06-23 2002-08-27 Aisan Kogyo Kabushiki Kaisha Evaporated fuel discharge preventing apparatus

Also Published As

Publication number Publication date
JPS5734650B2 (en) 1982-07-24

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