JPS52115249A - Detecting method of deviation of electron beams and moving direction o f materials - Google Patents
Detecting method of deviation of electron beams and moving direction o f materialsInfo
- Publication number
- JPS52115249A JPS52115249A JP3185876A JP3185876A JPS52115249A JP S52115249 A JPS52115249 A JP S52115249A JP 3185876 A JP3185876 A JP 3185876A JP 3185876 A JP3185876 A JP 3185876A JP S52115249 A JPS52115249 A JP S52115249A
- Authority
- JP
- Japan
- Prior art keywords
- deviation
- electron beams
- materials
- moving direction
- detecting method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To detect deviation by subsequently withdrawing the two electron beams formed by two slits and deflecting means, projecting said beams to a material, scanning the electron beames ober the material, moving the material and obtaining the relative position relation of the reference object part on the material.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51031858A JPS5848042B2 (en) | 1976-03-23 | 1976-03-23 | Method for detecting deviation between electron beam and material movement direction |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51031858A JPS5848042B2 (en) | 1976-03-23 | 1976-03-23 | Method for detecting deviation between electron beam and material movement direction |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52115249A true JPS52115249A (en) | 1977-09-27 |
JPS5848042B2 JPS5848042B2 (en) | 1983-10-26 |
Family
ID=12342737
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51031858A Expired JPS5848042B2 (en) | 1976-03-23 | 1976-03-23 | Method for detecting deviation between electron beam and material movement direction |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5848042B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6263425A (en) * | 1986-08-26 | 1987-03-20 | Toshiba Corp | Electron beam exposure system |
JPH0629197A (en) * | 1993-04-05 | 1994-02-04 | Toshiba Corp | Charged particle beam lithography |
JPH0629198A (en) * | 1993-04-05 | 1994-02-04 | Toshiba Corp | Charged particle beam lithography |
-
1976
- 1976-03-23 JP JP51031858A patent/JPS5848042B2/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6263425A (en) * | 1986-08-26 | 1987-03-20 | Toshiba Corp | Electron beam exposure system |
JPH0559577B2 (en) * | 1986-08-26 | 1993-08-31 | Tokyo Shibaura Electric Co | |
JPH0629197A (en) * | 1993-04-05 | 1994-02-04 | Toshiba Corp | Charged particle beam lithography |
JPH0629198A (en) * | 1993-04-05 | 1994-02-04 | Toshiba Corp | Charged particle beam lithography |
Also Published As
Publication number | Publication date |
---|---|
JPS5848042B2 (en) | 1983-10-26 |
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