JPS5365668A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5365668A
JPS5365668A JP14141676A JP14141676A JPS5365668A JP S5365668 A JPS5365668 A JP S5365668A JP 14141676 A JP14141676 A JP 14141676A JP 14141676 A JP14141676 A JP 14141676A JP S5365668 A JPS5365668 A JP S5365668A
Authority
JP
Japan
Prior art keywords
electron beam
exposure device
beam exposure
signal
error signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14141676A
Other languages
Japanese (ja)
Inventor
Sakae Miyauchi
Kazumitsu Tanaka
Nobuo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP14141676A priority Critical patent/JPS5365668A/en
Publication of JPS5365668A publication Critical patent/JPS5365668A/en
Pending legal-status Critical Current

Links

Landscapes

  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To ensure a correction in a short time for the position variation of the electron beam, by obtaining an error signal between the detection signal obtained through scanning of a reference mark and the preset reference signal and then piling the error signal on the pattern signal.
COPYRIGHT: (C)1978,JPO&Japio
JP14141676A 1976-11-25 1976-11-25 Electron beam exposure device Pending JPS5365668A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14141676A JPS5365668A (en) 1976-11-25 1976-11-25 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14141676A JPS5365668A (en) 1976-11-25 1976-11-25 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS5365668A true JPS5365668A (en) 1978-06-12

Family

ID=15291486

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14141676A Pending JPS5365668A (en) 1976-11-25 1976-11-25 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5365668A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6110236A (en) * 1984-06-26 1986-01-17 Fujitsu Ltd Electron beam exposure
JP2014093458A (en) * 2012-11-05 2014-05-19 Nuflare Technology Inc Charged particle beam drawing apparatus and charged particle beam drawing method
US11033114B2 (en) 2015-12-17 2021-06-15 Sealy Technology, Llc Coil-in-coil spring with variable loading response and mattresses including the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5055270A (en) * 1973-08-31 1975-05-15

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5055270A (en) * 1973-08-31 1975-05-15

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6110236A (en) * 1984-06-26 1986-01-17 Fujitsu Ltd Electron beam exposure
JP2014093458A (en) * 2012-11-05 2014-05-19 Nuflare Technology Inc Charged particle beam drawing apparatus and charged particle beam drawing method
US11033114B2 (en) 2015-12-17 2021-06-15 Sealy Technology, Llc Coil-in-coil spring with variable loading response and mattresses including the same

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