JPS5365668A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS5365668A JPS5365668A JP14141676A JP14141676A JPS5365668A JP S5365668 A JPS5365668 A JP S5365668A JP 14141676 A JP14141676 A JP 14141676A JP 14141676 A JP14141676 A JP 14141676A JP S5365668 A JPS5365668 A JP S5365668A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure device
- beam exposure
- signal
- error signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Control Of Position Or Direction (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To ensure a correction in a short time for the position variation of the electron beam, by obtaining an error signal between the detection signal obtained through scanning of a reference mark and the preset reference signal and then piling the error signal on the pattern signal.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14141676A JPS5365668A (en) | 1976-11-25 | 1976-11-25 | Electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14141676A JPS5365668A (en) | 1976-11-25 | 1976-11-25 | Electron beam exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5365668A true JPS5365668A (en) | 1978-06-12 |
Family
ID=15291486
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14141676A Pending JPS5365668A (en) | 1976-11-25 | 1976-11-25 | Electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5365668A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6110236A (en) * | 1984-06-26 | 1986-01-17 | Fujitsu Ltd | Electron beam exposure |
JP2014093458A (en) * | 2012-11-05 | 2014-05-19 | Nuflare Technology Inc | Charged particle beam drawing apparatus and charged particle beam drawing method |
US11033114B2 (en) | 2015-12-17 | 2021-06-15 | Sealy Technology, Llc | Coil-in-coil spring with variable loading response and mattresses including the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5055270A (en) * | 1973-08-31 | 1975-05-15 |
-
1976
- 1976-11-25 JP JP14141676A patent/JPS5365668A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5055270A (en) * | 1973-08-31 | 1975-05-15 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6110236A (en) * | 1984-06-26 | 1986-01-17 | Fujitsu Ltd | Electron beam exposure |
JP2014093458A (en) * | 2012-11-05 | 2014-05-19 | Nuflare Technology Inc | Charged particle beam drawing apparatus and charged particle beam drawing method |
US11033114B2 (en) | 2015-12-17 | 2021-06-15 | Sealy Technology, Llc | Coil-in-coil spring with variable loading response and mattresses including the same |
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