JPS53130033A - Electron beam sensitive material - Google Patents

Electron beam sensitive material

Info

Publication number
JPS53130033A
JPS53130033A JP4541977A JP4541977A JPS53130033A JP S53130033 A JPS53130033 A JP S53130033A JP 4541977 A JP4541977 A JP 4541977A JP 4541977 A JP4541977 A JP 4541977A JP S53130033 A JPS53130033 A JP S53130033A
Authority
JP
Japan
Prior art keywords
electron beam
beam sensitive
sensitive material
image
grups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4541977A
Other languages
Japanese (ja)
Other versions
JPS5935009B2 (en
Inventor
Kenichi Kawashima
Junji Sato
Konoe Miura
Chihiro Eguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Mitsubishi Kasei Corp
Original Assignee
Fujitsu Ltd
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Mitsubishi Kasei Corp filed Critical Fujitsu Ltd
Priority to JP4541977A priority Critical patent/JPS5935009B2/en
Publication of JPS53130033A publication Critical patent/JPS53130033A/en
Publication of JPS5935009B2 publication Critical patent/JPS5935009B2/en
Expired legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE: To impart superior sensitivity, image characteristics and etching resistance to a negative type electron beam sensitive photographic material and improve the stability of an image after being irradiated with electron beams, by using a specified polymer having chalcone grups in its side chain.
COPYRIGHT: (C)1978,JPO&Japio
JP4541977A 1977-04-20 1977-04-20 electron beam sensitive material Expired JPS5935009B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4541977A JPS5935009B2 (en) 1977-04-20 1977-04-20 electron beam sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4541977A JPS5935009B2 (en) 1977-04-20 1977-04-20 electron beam sensitive material

Publications (2)

Publication Number Publication Date
JPS53130033A true JPS53130033A (en) 1978-11-13
JPS5935009B2 JPS5935009B2 (en) 1984-08-25

Family

ID=12718737

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4541977A Expired JPS5935009B2 (en) 1977-04-20 1977-04-20 electron beam sensitive material

Country Status (1)

Country Link
JP (1) JPS5935009B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2017168700A1 (en) * 2016-03-31 2019-02-07 日立化成株式会社 Photosensitive resin composition, photosensitive resin film, method for producing cured product, laminate, and electronic component
JPWO2017168699A1 (en) * 2016-03-31 2019-02-14 日立化成株式会社 Photosensitive resin composition, photosensitive resin film, method for producing cured product, laminate, and electronic component

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2017168700A1 (en) * 2016-03-31 2019-02-07 日立化成株式会社 Photosensitive resin composition, photosensitive resin film, method for producing cured product, laminate, and electronic component
JPWO2017168699A1 (en) * 2016-03-31 2019-02-14 日立化成株式会社 Photosensitive resin composition, photosensitive resin film, method for producing cured product, laminate, and electronic component
JP2022048206A (en) * 2016-03-31 2022-03-25 昭和電工マテリアルズ株式会社 Photosensitive resin composition, photosensitive resin film, method for producing cured product, laminate, and electronic component

Also Published As

Publication number Publication date
JPS5935009B2 (en) 1984-08-25

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