JPS5370764A - Electrode formation method by lift off method - Google Patents
Electrode formation method by lift off methodInfo
- Publication number
- JPS5370764A JPS5370764A JP14686776A JP14686776A JPS5370764A JP S5370764 A JPS5370764 A JP S5370764A JP 14686776 A JP14686776 A JP 14686776A JP 14686776 A JP14686776 A JP 14686776A JP S5370764 A JPS5370764 A JP S5370764A
- Authority
- JP
- Japan
- Prior art keywords
- lift
- electrode formation
- formation method
- opaque
- lifting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE: To form electrodes by forming a material which may be formed at about 150°C or under and is opaque to ultraviolet rays on a resist film and lifting it off with particular sharpness.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14686776A JPS5370764A (en) | 1976-12-07 | 1976-12-07 | Electrode formation method by lift off method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14686776A JPS5370764A (en) | 1976-12-07 | 1976-12-07 | Electrode formation method by lift off method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5370764A true JPS5370764A (en) | 1978-06-23 |
Family
ID=15417351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14686776A Pending JPS5370764A (en) | 1976-12-07 | 1976-12-07 | Electrode formation method by lift off method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5370764A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55105348A (en) * | 1979-02-08 | 1980-08-12 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor device |
JPS5821843A (en) * | 1981-07-31 | 1983-02-08 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS5867060A (en) * | 1981-10-19 | 1983-04-21 | Oki Electric Ind Co Ltd | Manufacture of semiconductor integrated circuit device |
JPS60167448A (en) * | 1983-11-22 | 1985-08-30 | ブリテイシユ・テレコミユニケ−シヨンズ・パブリツク・リミテツド・カンパニ | Method of wiring metal of integrated circuit |
US7741755B2 (en) | 2005-10-28 | 2010-06-22 | Fujifilm Corporation | Recess-protrusion structure body, process for producing the same, piezoelectric device, and ink jet type recording head |
US7816842B2 (en) | 2007-03-26 | 2010-10-19 | Fujifilm Corporation | Patterned inorganic film formed of an inorganic material on a metal film having a surface which includes a plurality of surface-oxidized areas, piezoelectric device having the patterned inorganic film, and process for producing the inorganic film |
CN105742380A (en) * | 2016-03-30 | 2016-07-06 | 江苏欧达丰新能源科技发展有限公司 | Coining process of solar cell grid line electrode pattern |
-
1976
- 1976-12-07 JP JP14686776A patent/JPS5370764A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55105348A (en) * | 1979-02-08 | 1980-08-12 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor device |
JPS5821843A (en) * | 1981-07-31 | 1983-02-08 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS5867060A (en) * | 1981-10-19 | 1983-04-21 | Oki Electric Ind Co Ltd | Manufacture of semiconductor integrated circuit device |
JPH0239092B2 (en) * | 1981-10-19 | 1990-09-04 | Oki Electric Ind Co Ltd | |
JPS60167448A (en) * | 1983-11-22 | 1985-08-30 | ブリテイシユ・テレコミユニケ−シヨンズ・パブリツク・リミテツド・カンパニ | Method of wiring metal of integrated circuit |
US7741755B2 (en) | 2005-10-28 | 2010-06-22 | Fujifilm Corporation | Recess-protrusion structure body, process for producing the same, piezoelectric device, and ink jet type recording head |
US7816842B2 (en) | 2007-03-26 | 2010-10-19 | Fujifilm Corporation | Patterned inorganic film formed of an inorganic material on a metal film having a surface which includes a plurality of surface-oxidized areas, piezoelectric device having the patterned inorganic film, and process for producing the inorganic film |
US8017185B2 (en) | 2007-03-26 | 2011-09-13 | Fujifilm Corporation | Patterned inorganic film, piezoelectric device, and process for producing the same |
CN105742380A (en) * | 2016-03-30 | 2016-07-06 | 江苏欧达丰新能源科技发展有限公司 | Coining process of solar cell grid line electrode pattern |
CN105742380B (en) * | 2016-03-30 | 2017-12-19 | 江苏欧达丰新能源科技发展有限公司 | The impressing processing method of solar cell gate line electrode figure |
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