JPS5214371A - Flattening method of concave-convex surface - Google Patents

Flattening method of concave-convex surface

Info

Publication number
JPS5214371A
JPS5214371A JP9029475A JP9029475A JPS5214371A JP S5214371 A JPS5214371 A JP S5214371A JP 9029475 A JP9029475 A JP 9029475A JP 9029475 A JP9029475 A JP 9029475A JP S5214371 A JPS5214371 A JP S5214371A
Authority
JP
Japan
Prior art keywords
concave
convex surface
flattening method
flattening
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9029475A
Other languages
Japanese (ja)
Other versions
JPS5640491B2 (en
Inventor
Nobuyuki Nakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9029475A priority Critical patent/JPS5214371A/en
Publication of JPS5214371A publication Critical patent/JPS5214371A/en
Publication of JPS5640491B2 publication Critical patent/JPS5640491B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Bipolar Transistors (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To get the flat oxidation film by the double oxidation films and their etching.
COPYRIGHT: (C)1977,JPO&Japio
JP9029475A 1975-07-25 1975-07-25 Flattening method of concave-convex surface Granted JPS5214371A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9029475A JPS5214371A (en) 1975-07-25 1975-07-25 Flattening method of concave-convex surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9029475A JPS5214371A (en) 1975-07-25 1975-07-25 Flattening method of concave-convex surface

Publications (2)

Publication Number Publication Date
JPS5214371A true JPS5214371A (en) 1977-02-03
JPS5640491B2 JPS5640491B2 (en) 1981-09-21

Family

ID=13994501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9029475A Granted JPS5214371A (en) 1975-07-25 1975-07-25 Flattening method of concave-convex surface

Country Status (1)

Country Link
JP (1) JPS5214371A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6122631A (en) * 1984-02-03 1986-01-31 フエアチアイルド　カメラ　アンド　インストルメント　コ−ポレ−シヨン Method of flattening semiconductor and structure produced thereby
US5116768A (en) * 1989-03-20 1992-05-26 Fujitsu Limited Fabrication method of a semiconductor integrated circuit having an SOI device and a bulk semiconductor device on a common semiconductor substrate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57196885A (en) * 1981-05-26 1982-12-02 Tokyo Parts Kogyo Kk Speed controller for small-sized dc motor

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4997571A (en) * 1973-01-17 1974-09-14

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4997571A (en) * 1973-01-17 1974-09-14

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6122631A (en) * 1984-02-03 1986-01-31 フエアチアイルド　カメラ　アンド　インストルメント　コ−ポレ−シヨン Method of flattening semiconductor and structure produced thereby
US5116768A (en) * 1989-03-20 1992-05-26 Fujitsu Limited Fabrication method of a semiconductor integrated circuit having an SOI device and a bulk semiconductor device on a common semiconductor substrate

Also Published As

Publication number Publication date
JPS5640491B2 (en) 1981-09-21

Similar Documents

Publication Publication Date Title
JPS51111072A (en) Photo etching method
JPS5267969A (en) Manufacture of semiconductor unit
JPS5214371A (en) Flattening method of concave-convex surface
JPS52116174A (en) Manufacture of semiconductor device
JPS51136288A (en) Photo etching using non-crystalline carchogenide glass thin film
JPS5386177A (en) Production of semiconductor device
JPS5348458A (en) Production of semiconductor device
JPS5235180A (en) Process for the production of an antistatic agent
JPS5237159A (en) Magic mirror and production method of same
JPS5258472A (en) Selective oxidation
JPS5255381A (en) Photo exposure method
JPS5269266A (en) Production of semiconductor device
JPS51147177A (en) A treatment method of tantaum oxide
JPS52179A (en) Method of fabricating semiconductor
JPS51138875A (en) Intermittent elmination
JPS52112281A (en) Manufacture of semiconductor
JPS5227280A (en) Method to form pinholes
JPS51138167A (en) Production method of semiconductor device
JPS51151094A (en) Light conductive element and its manufacturing method
JPS51123563A (en) Silicon oxidation film pattern formation method
JPS5380973A (en) Manufacture of mask
JPS5258375A (en) Production of low reflection metal mask
JPS5222075A (en) Embossed film
JPS5269561A (en) Electrode of semiconductor device
JPS5216198A (en) Electrode for indication device