JPS5258375A - Production of low reflection metal mask - Google Patents
Production of low reflection metal maskInfo
- Publication number
- JPS5258375A JPS5258375A JP13402775A JP13402775A JPS5258375A JP S5258375 A JPS5258375 A JP S5258375A JP 13402775 A JP13402775 A JP 13402775A JP 13402775 A JP13402775 A JP 13402775A JP S5258375 A JPS5258375 A JP S5258375A
- Authority
- JP
- Japan
- Prior art keywords
- metal mask
- production
- low reflection
- reflection metal
- oxidizing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To decrease the surface reflection factor of a metal mask formed on the surface of a substrate by oxidizing the entire surface including the top and lateral surface of the metal mask by an anodic oxidation method.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13402775A JPS5258375A (en) | 1975-11-10 | 1975-11-10 | Production of low reflection metal mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13402775A JPS5258375A (en) | 1975-11-10 | 1975-11-10 | Production of low reflection metal mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5258375A true JPS5258375A (en) | 1977-05-13 |
Family
ID=15118655
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13402775A Pending JPS5258375A (en) | 1975-11-10 | 1975-11-10 | Production of low reflection metal mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5258375A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002251000A (en) * | 2001-02-26 | 2002-09-06 | Semiconductor Leading Edge Technologies Inc | Method of manufacturing phase shift mask, phase shift mask, phase shift mask blank and method of manufacturing semiconductor device |
-
1975
- 1975-11-10 JP JP13402775A patent/JPS5258375A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002251000A (en) * | 2001-02-26 | 2002-09-06 | Semiconductor Leading Edge Technologies Inc | Method of manufacturing phase shift mask, phase shift mask, phase shift mask blank and method of manufacturing semiconductor device |
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