JPS5258375A - Production of low reflection metal mask - Google Patents

Production of low reflection metal mask

Info

Publication number
JPS5258375A
JPS5258375A JP13402775A JP13402775A JPS5258375A JP S5258375 A JPS5258375 A JP S5258375A JP 13402775 A JP13402775 A JP 13402775A JP 13402775 A JP13402775 A JP 13402775A JP S5258375 A JPS5258375 A JP S5258375A
Authority
JP
Japan
Prior art keywords
metal mask
production
low reflection
reflection metal
oxidizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13402775A
Other languages
Japanese (ja)
Inventor
Akihiro Tomosawa
Masayasu Tsunematsu
Toru Kawanobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13402775A priority Critical patent/JPS5258375A/en
Publication of JPS5258375A publication Critical patent/JPS5258375A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To decrease the surface reflection factor of a metal mask formed on the surface of a substrate by oxidizing the entire surface including the top and lateral surface of the metal mask by an anodic oxidation method.
COPYRIGHT: (C)1977,JPO&Japio
JP13402775A 1975-11-10 1975-11-10 Production of low reflection metal mask Pending JPS5258375A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13402775A JPS5258375A (en) 1975-11-10 1975-11-10 Production of low reflection metal mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13402775A JPS5258375A (en) 1975-11-10 1975-11-10 Production of low reflection metal mask

Publications (1)

Publication Number Publication Date
JPS5258375A true JPS5258375A (en) 1977-05-13

Family

ID=15118655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13402775A Pending JPS5258375A (en) 1975-11-10 1975-11-10 Production of low reflection metal mask

Country Status (1)

Country Link
JP (1) JPS5258375A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002251000A (en) * 2001-02-26 2002-09-06 Semiconductor Leading Edge Technologies Inc Method of manufacturing phase shift mask, phase shift mask, phase shift mask blank and method of manufacturing semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002251000A (en) * 2001-02-26 2002-09-06 Semiconductor Leading Edge Technologies Inc Method of manufacturing phase shift mask, phase shift mask, phase shift mask blank and method of manufacturing semiconductor device

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