JPS5583233A - Electron beam scanning method for mark detection - Google Patents
Electron beam scanning method for mark detectionInfo
- Publication number
- JPS5583233A JPS5583233A JP15891378A JP15891378A JPS5583233A JP S5583233 A JPS5583233 A JP S5583233A JP 15891378 A JP15891378 A JP 15891378A JP 15891378 A JP15891378 A JP 15891378A JP S5583233 A JPS5583233 A JP S5583233A
- Authority
- JP
- Japan
- Prior art keywords
- mark
- scanning
- constant
- increased
- detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Abstract
PURPOSE:To make positioning using constant generation of secondary electrons caused by scanning by a method wherein beam length is made constant in the direction of beam scanning and charged in the direction of mark edge depending on the speed of scanning. CONSTITUTION:If the speed of scanning is increased in mark scanning area to facilitate resist removal, then secondary electron generation per unit time is reduced to cause mark detection to become impossible. If beam size is expanded to increase the amount of secondary electron generation, the difference between electrons from the mark and those from other area becomes small to cause detection to be difficult. Thus, the beam size BM1 in the direction of mark scanning is made constant, and the size BM2 at right angle is increased. This allows constant secondary electron generation if marking speed is increased. Because the beam size is not changed in the direction of mark scanning, mark detection accuracy is kept constant. In this manner, mark detection can be performed without causing detection accuracy decrease and resist removal difficulty.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15891378A JPS5583233A (en) | 1978-12-20 | 1978-12-20 | Electron beam scanning method for mark detection |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15891378A JPS5583233A (en) | 1978-12-20 | 1978-12-20 | Electron beam scanning method for mark detection |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5583233A true JPS5583233A (en) | 1980-06-23 |
JPS6258140B2 JPS6258140B2 (en) | 1987-12-04 |
Family
ID=15682076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15891378A Granted JPS5583233A (en) | 1978-12-20 | 1978-12-20 | Electron beam scanning method for mark detection |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5583233A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5870554U (en) * | 1981-11-09 | 1983-05-13 | トヨタ自動車株式会社 | damper pulley |
JPS58102524A (en) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | Position aligning method for electron beam exposing apparatus |
JPS58151041A (en) * | 1982-03-03 | 1983-09-08 | Toshiba Corp | Redundancy apparatus |
JPS61210625A (en) * | 1985-03-15 | 1986-09-18 | Toshiba Corp | Electron beam lighography |
-
1978
- 1978-12-20 JP JP15891378A patent/JPS5583233A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5870554U (en) * | 1981-11-09 | 1983-05-13 | トヨタ自動車株式会社 | damper pulley |
JPS58102524A (en) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | Position aligning method for electron beam exposing apparatus |
JPS58151041A (en) * | 1982-03-03 | 1983-09-08 | Toshiba Corp | Redundancy apparatus |
JPS61210625A (en) * | 1985-03-15 | 1986-09-18 | Toshiba Corp | Electron beam lighography |
Also Published As
Publication number | Publication date |
---|---|
JPS6258140B2 (en) | 1987-12-04 |
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