JPS57118637A - Detection of base mark position for electron beam exposure - Google Patents

Detection of base mark position for electron beam exposure

Info

Publication number
JPS57118637A
JPS57118637A JP11318780A JP11318780A JPS57118637A JP S57118637 A JPS57118637 A JP S57118637A JP 11318780 A JP11318780 A JP 11318780A JP 11318780 A JP11318780 A JP 11318780A JP S57118637 A JPS57118637 A JP S57118637A
Authority
JP
Japan
Prior art keywords
scanning
mark
electron beam
starting point
starting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11318780A
Other languages
Japanese (ja)
Inventor
Nobumasa Watanabe
Tomoki Shiyudo
Kazumi Iwatate
Tadamasa Ogawa
Masami Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
NEC Corp
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
NEC Corp
Nippon Telegraph and Telephone Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, NEC Corp, Nippon Telegraph and Telephone Corp, Nippon Electric Co Ltd filed Critical Jeol Ltd
Priority to JP11318780A priority Critical patent/JPS57118637A/en
Publication of JPS57118637A publication Critical patent/JPS57118637A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Abstract

PURPOSE:To perform the detection of a base mark position for electron beam exposure with high speed and high accuracy by a method wherein the operation for searching the central position of the mark is carried out only by receiving necessary paramenters at first and without using a computer. CONSTITUTION:A means, by which the first and the second starting point of electron beam scanning are given at first and the first stopping point is obtained by scanning from the first starting point of scanning, then the second stopping point is obtained by scanning from the second starting point of scannig and the position of a base mark is determined by taking the average value of the first and second stopping point, is provided. For instance, the first scanning of the electron beam is performed in parallel to X-axis starting from the first starting point (X1, Y1) of scanning and the mark is detected at the position (Xm1, Y1). In the same way, the second scanning is performed starting from the second starting point (X2, Y1) and the mark is detected at the position(Xm2, Y1). A calculator calculates the average of Xm1 and Xm2 and the central position of the mark is put in a computer 1.
JP11318780A 1980-08-18 1980-08-18 Detection of base mark position for electron beam exposure Pending JPS57118637A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11318780A JPS57118637A (en) 1980-08-18 1980-08-18 Detection of base mark position for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11318780A JPS57118637A (en) 1980-08-18 1980-08-18 Detection of base mark position for electron beam exposure

Publications (1)

Publication Number Publication Date
JPS57118637A true JPS57118637A (en) 1982-07-23

Family

ID=14605751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11318780A Pending JPS57118637A (en) 1980-08-18 1980-08-18 Detection of base mark position for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS57118637A (en)

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